FEI.

FEI FEI

Fédération Équestre Internationale. released the Accura XT+ DualBeam mask repair system for repair of photolithography mask defects for the 65 nm node. It combines a focused ion beam Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site-specific analysis, deposition, and ablation of materials.

The FIB is a scientific instrument that resembles a scanning electron microscope. column and an environmental scanning electron microscope electron microscope: see microscope. (SEM).

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Title Annotation:	Surface science: product introductions; FEI Co. launches mask repair system
Publication:	Instrument Business Outlook
Article Type:	Brief Article
Geographic Code:	1USA
Date:	Jan 31, 2005
Words:	34
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