Extraction Systems Forms New Optics Protection R&D Group; Grayfer Tapped to Lead Optics Contamination Research.

Business/Technology Editors

FRANKLIN, Mass.--(BUSINESS WIRE)--Feb. 27, 2001

Extraction Systems Inc. has launched a new research and development group to address protection of optical elements in advanced deep UV lithography systems. As the industry migrates to 193 nm lithography, optics contamination has surfaced as a key issue for semiconductor manufacturers. Molecular contaminants can react with the higher energy source found in 193 nm lithography and form films on exposed optical surfaces. If left unchecked, these contaminants will lead to optics performance degradation and shortened optical systems lifetimes.

"Extraction's attention to optics contamination is a key part of our strategy going forward. The cost of the optics assembly used in 193 nm tools is the highest the industry has ever seen, and protection of these optics is a prime concern for our customers," said Devon Kinkead, president and CEO of Extraction Systems. "The industry's understanding of optical contamination risks is still in its infancy. By forming this R&D group, Extraction will continue its tradition of providing best-in-class molecular contamination monitoring and filtration technology."

To lead this effort, Extraction has named Anatoly Grayfer director and senior scientist for the optics protection group. In this role, Grayfer will be responsible for leading a team of scientists in exploring optics contamination and protection issues and is charged with new product development, support of existing products, and analytical services. He reports to Oleg Kishkovich, director of technology.

"Anatoly has been a key player in the success of Extraction's AMC monitoring and filtration technology," Kinkead said. "Now, he brings his strong background in chemistry, expertise in characterizing and capturing molecular contaminants, and understanding of Extraction's customer requirements to focus on optics protection issues."

Grayfer joined Extraction Systems in 1998, most recently holding the position of scientist. He was a senior member of the team that developed the contamination control methods found in the TMB-RTM, which is the base platform for the successful TMB-150 process monitor. He was also instrumental in the development of Extraction's Vaporsorb II, a breakthrough polymeric catalyst-based filter for DUV track systems and exposure equipment.

Prior to Extraction Systems, Grayfer worked as a senior applications chemist for Zentox Corp., where he helped develop air decontamination processes based on the application of ultraviolet and low-temperature plasma. He also spent four years as a senior research associate at Boston University's department of chemistry, where he explored a new technology for chemical filtration.

Grayfer holds a doctorate in physical chemistry from the Russian Academy of Sciences Karpov Institute of Physical Chemistry and a master's degree in chemical technology from Mendeleyev Chemical-Technological Institute.

About Extraction

Extraction produces a wide range of airborne molecular contamination measurement and control products for ultraclean environments. Headquartered in Franklin, Mass., the company provides solutions to the global microelectronics industry in partnership with Metron Technology in Europe, Korea and Singapore, Hakuto Co. in Japan, and Hermes Epitek in Taiwan. http://www.extractionsystemsinc.com