Printer Friendly
The Free Library
5,673,217 articles and books
Member login
User name  
Password 
 
Join us Forgot password?

Entegris Introduces New Integrated Photochemical Filtration and Dispense Solutions for 193nm (ArF) Technology.


Impact([R]) Mini, Impact([R]) Duo, Optimizer([R]) ST 30nm filters and IntelliGen([R]) Mini dispense systems provide application-focused solutions for advanced photolithography A lithographic technique used to transfer the design of circuit paths onto printed circuit boards as well as the circuit paths and electronic elements of a chip onto a wafer's surface.

A photomask is created with the design for each layer of the board or wafer (chip).
 applications

CHASKA, Minn. -- Entegris, Inc. (NASDAQ NASDAQ
 in full National Association of Securities Dealers Automated Quotations

U.S. market for over-the-counter securities. Established in 1971 by the National Association of Securities Dealers (NASD), NASDAQ is an automated quotation system that reports on
:ENTG) announced the introduction of several new products for advanced 193nm (ArF) photolithography applications at Semicon Japan 2006. These products, which include the Impact([R]) Duo, Impact([R]) Mini, IntelliGen([R]) Mini and Optimizer([R]) ST, provide integrated solutions for the filtration and dispense of photochemicals and other coatings on to the wafer.

"In certain ArF processes, defects such as micro-bridging are still common and can lead to reduced yields and increased cost. We believe that by using our new filter and dispense products in these photochemical photochemical

in laser treatment, the laser light is absorbed and converted into chemical energy.
 solutions, customers can significantly reduce the defects found in their processes," said Yuichi Tamura, product and technology development director of liquid microcontamination for Nihon Entegris in Japan.

The new products include:

* Impact Duo filter. Designed for advanced photochemical filtration, the Impact Duo combines advanced membrane technologies to provide the highest level of retention. These membrane technologies - sieving and non-sieving - utilize a dual-capture filtration mechanism to ensure defect-causing impurities are removed from photochemical solutions before reaching the wafer surface.

* IntelliGen Mini photochemical dispense system. The IntelliGen Mini dispense system utilizes proprietary two-stage technology and closed-loop pressure control to eliminate particulates and bubbles while providing accurate and repeatable dispense. By detecting variations during photoresist A film used in photolithography that temporarily holds the pattern of a circuit path or microscopic element of a chip. When exposed to light, it hardens and is resistant to the acid bath that washes away the unexposed areas. Not to be confused with photoresistor.  dispense that may be caused by bubbles or clogged nozzles, the IntelliGen Mini dispense system can prevent wafer scrap due to coating problems. Introduced in July 2006, the IntelliGen Mini photochemical dispense system has been specified by major OEMs for new track shipments, as well as by leading semiconductor device makers in Japan, Asia, Europe and North America North America, third largest continent (1990 est. pop. 365,000,000), c.9,400,000 sq mi (24,346,000 sq km), the northern of the two continents of the Western Hemisphere.  to retrofit ret·ro·fit  
v. ret·ro·fit·ted or ret·ro·fit, ret·ro·fit·ting, ret·ro·fits

v.tr.
1. To provide (a jet, automobile, computer, or factory, for example) with parts, devices, or equipment not in
 existing track dispense systems.

* Impact Mini. The Impact Mini filter is designed to work seamlessly with the IntelliGen Mini dispense system. The Impact Mini filter features an optimized filtration area and hold-up volume intended to minimize chemical waste, shorten filter change-out time and reduce defect levels during semiconductor fabrication fabrication (fab´rikā´shn),
n the construction or making of a restoration.
. The filter design also utilizes a greater than 60 percent reduction in surface area, thus reducing overall photochemical usage costs associated with the unusable portion of photoresist solution in the fabrication process.

* Optimizer ST 30nm developer and DI water filter. The Optimizer ST filter provides improved particle retention and cleanliness Cleanliness
See also Orderliness.

Cleverness (See CUNNING.)

Berchta

unkempt herself, demands cleanliness from others, especially children. [Ger. Folklore: Leach, 137]

cat

continually “washes” itself.
 for point-of-use developer and DI water filtration in ArF processes. Optimizer ST filters are designed to integrate with Entegris' Optimizer ST2 manifolds, taking advantage of our patented Connectology([R]) technology for a safer, more effective and faster filter change-out.

Chad Ruwe, vice president and general manager of liquid microcontamination for Entegris, said: "Entegris continues to lead the photochemical filtration and delivery markets by continuing to introduce application focused solutions to ensure our customers meet their technology roadmaps in a cost effective and timely manner. We are the only company in the semiconductor industry to offer a fully integrated solution for photoresist dispense and filtration."

For more information, please visit Entegris at exhibit # 2B-501 at Semicon Japan, December 6-8.

ABOUT ENTEGRIS

Entegris is the global leader in materials integrity management - delivering a wide range of products for purifying pu·ri·fy  
v. pu·ri·fied, pu·ri·fy·ing, pu·ri·fies

v.tr.
1. To rid of impurities; cleanse.

2. To rid of foreign or objectionable elements.

3.
, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high tech industries. Entegris is ISO (1) See ISO speed.

(2) (International Organization for Standardization, Geneva, Switzerland, www.iso.ch) An organization that sets international standards, founded in 1946. The U.S. member body is ANSI.
 9001 certified and has manufacturing, customer service or research facilities in the United States United States, officially United States of America, republic (2005 est. pop. 295,734,000), 3,539,227 sq mi (9,166,598 sq km), North America. The United States is the world's third largest country in population and the fourth largest country in area. , China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.

Impact, IntelliGen, Optimizer, Connectology and Entegris are registered trademarks of Entegris Inc.
COPYRIGHT 2006 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2006, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

 Reader Opinion

Title:

Comment:



 

Article Details
Printer friendly Cite/link Email Feedback
Publication:Business Wire
Date:Dec 6, 2006
Words:589
Previous Article:Media and Community Event Friday, December 8th, 4:00 PM to 9:00 PM in East Liberty.
Next Article:AssetMark Retains Wellington Management for Mutual Fund and Private Account Program.
Topics:



Related Articles
ASML SELECTS 300MM TWINSCAN AS SINGLE PLATFORM AT 193NM WAVELENGTH.
Entegris Increases Intellectual Property with New Patents; Subsidiary NT International's Pressure Transducer and Integrated Flow Controller added to...
Semiconductor Industry Recognizes Need for Entegris' Liquid Flow Control Technology.
Entegris Receives Repeat Orders for Integrated Flow Controllers from Major DRAM Fab and Major Foundry.
Dispensing/curing equipment.(Brochures)
Entegris Confident of Patent Position; Plans Prompt Response and Vigorous Defense.
Entegris Launches New Immersion Lithography Innovation; LiquidLens(TM) System Represents Major Entegris-Mykrolis Merger Success Story.
Entegris Launches New Photochemical Dispense System; IntelliGen(R) Mini Earns Positive Customer Evaluations - Product Shipments Underway.
Entegris Reports Results for Fiscal Third Quarter of 2006.
Pall Corporation Files New Patent Infringement Lawsuit against Entegris, Inc.

Terms of use | Copyright © 2009 Farlex, Inc. | Feedback | For webmasters | Submit articles