EUV lithography.

9780819469649

EUV lithography.

Ed. by Vivek Bakshi.

SPIE

2009

673 pages

$105.00

Hardcover

Press monograph; 136

QC459

Extreme ultraviolet lithography (EUVL) is one of the leading patterning technologies for the production of computer chips. This reference contains 12 chapters by leading researchers and suppliers in the EUVL field. It also contains a detailed appendix with EUVL reference data. Chapter topics are intended to meet the needs of practitioners of the technology as well as readers who want an introduction to EUVL. Early chapters present a history of EUVL development and overview EUVL source technology. Later chapters cover EUV optics, EUV wavefront measurement techniques, contamination in EUVL scanners, mask technology, resist technology, design considerations, MET optics, and lithography cost trends. The appendix contains reference data for the EUV spectral region. The editor works in the private sector. The book is co-published with Wiley- Interscience.

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