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Developments in surface contamination and cleaning fundamentals and applies aspects.

9780815515555

Developments in surface contamination and cleaning fundamentals and applies aspects.

Ed. by Rajiv Kohli et al.

William Andrew Publishing

2008

1164 pages

$295.00

Hardcover

TA418

Virtually every industry is concerned about whether products have film-type or particulate contaminants, whether on work in progress or finished goods. While some are simply aesthetically aggravating, others can cause extremely expensive "killer defects," resulting in reduced yields and reliability at the very least. This collection of articles details methods of detection, characteristics and removal of both film and particulate contaminants and methods of preventing contamination of surfaces. Contributors address the physical nature of small particles and their interaction, transport and deposit of particles and their cleaning, tribological implications of particles, airborne molecular contamination, particle adhesion and removal, electrostatic discharge controls, electron microscopy techniques, surface analysis methods, ionic contamination, colorimetric interferometry for thin film contaminates, "wettability" techniques, surfactants, solvents, chemical cleaning, high-speed jets, microabrasive processing, argon/nitrogen cryogenic aerosols, carbon dioxide snow cleaning, coatings for prevention of biological contamination, and semiconductor drying methods. Published by and distributed in North America by William Andrew; distributed in rest of world by Elsevier.

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Publication:SciTech Book News
Article Type:Brief article
Date:Mar 1, 2008
Words:194
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