Cymer Partners With IMEC On Immersion Lithography.

SAN DIEGO -- Cymer, Inc. (Nasdaq NM: CYMI), the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC's 300 mm wafer fab facility in Leuven, Belgium. The tool integration marks the first milestone in the company's participation in IMEC's Industrial Affiliation Program (IIAP) on Advanced Lithography -- aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.

Commenting on this milestone, Bob Akins, Cymer's chairman and chief executive officer stated, "Cymer is dedicated to innovating lithography technologies that enable the world's most advanced lithography processes. We are excited about the opportunity be a part of IMEC's IIAP to collectively ensure the availability of cost-effective immersion lithography process technology for industry adoption at the 45nm node. Integrating our XLA 105 into the 193nm immersion scanner at IMEC further validates the ability of our patented Master Oscillator Power Amplifier (MOPA) architecture to meet the exacting specifications of the industry's emerging lithography technologies."

The XLA 105 is Cymer's second-generation, leading-edge, ArF light source to feature the production-proven, dual-chamber MOPA platform -- providing lithography process engineers with the ultra line-narrowed and power requirements needed for today's most advanced processes. Already widely adopted for leading-edge dry 193nm scanners, the XLA 105 enables the development of and manufacturing with the immersion lithography process. To date, all 193nm immersion scanners in the field use Cymer light sources.

Commenting on Cymer's participation in the IIAP on Advanced Lithography, Dr. Luc Van den hove, vice president of IMEC, stated, "IMEC is pleased to welcome Cymer to the IIAP on Advanced Lithography. As a leading supplier of DUV light sources for semiconductor manufacturing, Cymer will provide tremendous technology expertise. With Cymer's participation, the IIAP will investigate how light sources can be used to further enhance the latitude of the lithographic processes to extend Moore's law."

Forward Looking Statements

Statements in this press release that are not strictly historical in nature are forward-looking statements. These statements include, but are not limited to statements regarding: Cymer and IMEC ensuring the availability of cost-effective immersion lithography technology at the 45nm node; and the XLA 105 enabling the development of and manufacturing with the immersion lithography process. These statements are only predictions based on current information and expectations and involve a number of risks and uncertainties. Actual events or results may differ materially from those projected in any of such statements due to various factors, including but not limited to: cyclicality in the market for semiconductor manufacturing equipment; the rate at which semiconductor manufacturers take delivery of photolithography tools from the company's customers; the performance and market acceptance of the company's new products or technologies, and the XLA 105 in particular not performing up to expectations; new and enhanced product offerings by competitors; the company's ability to secure adequate supplies of critical components for its advanced products; and the company's ability to manage its expense levels and unanticipated expenses. For a discussion of these and other factors which may cause our actual events or results to differ from those projected, please refer to the company's most recent annual report on Form 10-K and quarterly reports on Form 10-Q, as well as other subsequent filings with the Securities and Exchange Commission.

About Cymer

Cymer, Inc. is the world's leading supplier of DUV illumination sources, the essential light source for DUV photolithography systems. DUV lithography is a key enabling technology that has allowed the semiconductor industry to meet the exacting specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the Company's SEC filings, on the Internet at www.cymer.com or by contacting the company directly.

About IMEC Industrial Affiliation Programs

The IMEC Industrial Affiliation Program (IIAP) is IMEC's premier R&D collaboration formula for joint R&D between industrial researchers and IMEC research teams. IIAPs focus on a specific topic or technology area. The concept is recognized worldwide as one of the most successful international partnership models for joint development of next-generation technologies.

About IMEC

IMEC is a world leading independent research center in nanoelectronics and nanotechnology. Its research focuses on the next-generation of chips and systems, and on the enabling technologies for ambient intelligence. IMEC's research bridges the gap between fundamental research at universities and technology development in industry. Its unique balance of processing and system know-how, intellectual property portfolio, state-of-the-art infrastructure and a strong network of companies, universities and research institutes worldwide, positions IMEC as a key partner with which to develop and improve technologies for future systems.

IMEC is headquartered in Leuven, Belgium and has representatives in the US, China and Japan. Its staff of more than 1300 people includes over 380 industrial residents and guest researchers. In 2003, its revenues were EUR 145 million. Further information on IMEC can be found on www.imec.be