Cymer Introduces The ELS-5010 Excimer Laser for Advanced DUV Stepper and Scanner Photolithography Applications.

SAN DIEGO--(BUSINESS WIRE)--March 30, 1998--Cymer, Inc. (NASDAQ NM:CYMI), the world's leading supplier of the excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, today unveiled the newest addition to its production-proven excimer laser product line -- the ELS-5010 krypton fluoride (KrF) 248nm laser.

According to Pascal Didier, Cymer's senior vice president of worldwide customer operations, the ELS-5010 will play a vital role in meeting the SIA roadmap by enabling the manufacture of devices with design rules below the quarter micron threshold, which are currently moving from R&D into production.

"As chipmakers drive beyond this barrier, they need advanced lithography tools with more sophisticated laser illumination sources to image these tighter critical dimensions (CDs)," said Didier. "In addition to enabling the imaging of these smaller CDs, the 5010 has been optimized for highly productive, reliable operation. As a result, the ELS-5010 has the potential to help chipmakers achieve both higher yields and higher speed devices-thus, greatly improving a fab's bottom line."

Expanding upon the performance and reliability of Cymer's flagship ELS-5000, which is designed for refractive exposure tools with 0.6 and smaller numerical aperture (NA) lens designs, the ELS-5010 is specifically designed to address next-generation stepper and scanner applications with 0.7 NA lens designs-offering tighter resolution capabilities through narrower bandwidths.

In addition, the ELS-5010, which is now available to meet volume market demand, delivers improved energy stability to enable higher device yields.

Didier added that the introduction of the ELS-5010 is a result of the company's aggressive R&D effort to further solidify its lead position in the DUV excimer laser market.

"The current availability of the ELS-5010-just seven months after the initial design conception-signals Cymer's ongoing commitment to providing customers with the most advanced laser solutions for their existing and emerging DUV photolithography needs. As resolution capabilities become increasingly critical in advanced DUV processes over the next few years, we are fully prepared to capitalize on this need through our global service and support infrastructure and comprehensive line of laser products for customers' individual lens design requirements," said Didier.

Cymer reports that it is already seeing strong global interest in the ELS-5010 in the DUV lithography marketplace. Cymer has begun shipping the ELS-5010 this quarter for use in the manufacture of next-generation devices. In addition, the company has received significant orders for the ELS-5010 for 1998.

Commenting on the laser's specific performance attributes, David Brandt, Cymer's director of product marketing noted, "The ELS-5010 enables precise imaging performance within the reduced depth of focus (DOF) caused by increasing the NA of the lens design."

To address the resolution requirements for 0.7 NA lens designs, Brandt added that the ELS-5010 provides bandwidth narrowing less than 0.6 picometer (pm), which is not currently available with any other excimer laser.

As an added advantage, the ELS-5010 offers superior energy stability (less than or equal to plus/minus 6 percent) to maximize CD control and increase device yields. The ELS-5010 also features an improved laser discharge chamber that promotes greater efficiency for a longer usable lifetime.

To enable significantly reduced exposure times in comparison to i-line or other laser-based systems, the ELS-5010 features a 1kHz repetition rate. In addition, the laser offers output power exceeding 10W and a pulse energy of 10 millijoules (mJ). The ELS-5010's modular construction design allows it to be serviced from one side-enabling floor space optimization, easy diagnosis and minimal system downtime. The ELS-5010 also complies with all SEMI and CE marking requirements.

Cymer will be featuring information on the ELS-5010 at its booth No. 838 at the SEMICON Europa 98 trade show and conference to be held March 31-April 2, 1998 in Geneva, Switzerland.

Cymer, Inc. is the leading provider of excimer laser illumination sources for use in deep ultraviolet (DUV) photolithography systems targeted at the pilot and production segments of the semiconductor manufacturing market. Further information on Cymer may be obtained from the Company's SEC filings, the Internet at http://www.cymer.com or by contacting the Company directly.

CONTACT: Cymer, Inc.

Leslie Cole, 619/451-7149

or

MCA, Inc.

Marie Labrie, 650/968-8900