Chipworks Uncovers the Power of Three Leading Edge 90nm Technology Devices.

Business Editors/High-Tech Writers

OTTAWA--(BUSINESS WIRE)--Feb. 18, 2004

Chipworks Inc. ("Chipworks"), the standard setting supplier of reverse engineering services, announced today comparative results from its analysis of three (3) leading 90 nm technology devices - the Sony CXD9797GB Emotion Engine Microprocessor & Graphics Synthesizer, Texas Instruments (TI) TMX320C6416 1 GHz DSP, and the Intel "Prescott".

The industry has been anticipating the arrival of 90 nm parts for some time now. It is in the competitive nature of the semiconductor business that three (3) devices become available within days of each other. Chipworks has obtained samples of these revolutionary devices and findings for each will be available in separate upcoming structural analysis reports.

Even though there is some industry controversy on what actually constitutes a 90 nm process, all three of these parts are manufactured using leading edge processes, however with different emphases. Intel has the most pronounced technological jump, integrating both low-k intermetal dielectric (IMD) materials and strained silicon, while TI and Sony both use low-k IMD and nanometer-scale (approximately 50 nm) transistors.

In analyzing the Sony Emotion Engine Microprocessor & Graphics Synthesizer, fabbed in the Sony/Toshiba CMOS4 process, we found transistor gates less than 50 nm seen in our samples, and six levels of copper plus aluminum were used. SIMS analysis shows that the intermetal dielectrics include low-k (Applied Materials' Black Diamond) at the critical levels, FSG at the intermediate levels, and undoped glass at the power bus levels.

Chipworks has seen 45-50 nm transistor gateson the TI DSP. The part has seven (7) levels of copper metallization with an aluminum bond pad layer. The process reportedly uses Novellus' Coral low-k dielectric material to reduce capacitance and boost overall chip operating frequency, and also incorporates upper undoped layers to provide physical strength.

Intel has taken a different path with their 90 nm technology. They are the first to implement a uniaxial strained silicon process with different stress techniques on NMOS and PMOS transistors, and are one of the first to use nickel silicide. The two-stack low-k intermetal dielectric layers, are reported to be ASM's Aurora material. Gate lengths are in the 45 - 50 nm range.

According to Dick James, senior technology analyst for Chipworks, "We are extremely excited to obtain all these leading-edge parts within days of each other. Our initial images show some interesting features in all three (3) devices, and the comparison between the different transistor and low-k structures is fascinating. The strain engineering of the transistors in the Intel chip will require some detailed transmission electron microscopy work, so our in-house TEM will be a great asset."

Chipworks will also use their in-house Scanning Capacitance Microscope to look inside the technology at the detailed doping characteristics of the devices.

"Findings for each device will be available in separate upcoming structural analysis reports, so that process engineers can make a comparison of the differing approaches pushing the performance limits of nanometer silicon. Each report will include an overview, package and die photos, process, transistor, materials and, low-k dielectric analysis, as well as critical die dimensions." stated Chipworks president, Julia Elvidge.

About Chipworks

Chipworks is an internationally recognized technical services company that analyzes the circuitry and physical composition of semiconductor chips and electronics systems for applications in patent licensing support and competitive study. Chipworks' technical experts use sophisticated lab facilities and a rich library of in-house semiconductor data and expertise to conduct detailed analyses of a wide selection of chip types. Chipworks develops high value, meticulously researched, on-time reports presented in a format that is easy to understand and tailored to customer needs.

Since 1992, Chipworks has successfully helped semiconductor and electronics organizations achieve their goals by supporting research and development efforts and patent portfolio management. Headquartered in Ottawa, Canada, the Company has offices worldwide. Chipworks can be visited via the Internet at www.chipworks.com

Pictures of the devices are available on CCNMatthews's Website at the following addresses:

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