Canon U.S.A. Announces Availability of New 300mm-compatible Semiconductor Lithography Tool Line.

Business Editors

SAN JOSE, Calif.--(BUSINESS WIRE)--Dec. 18, 2001

New Features: 350 mm/sec Scan Speed, 0.80 NA lens (KrF scanner),

50x50 mm Field (i-line Stepper), High Compatibility With 300 mm

Fab Automation Requirements

Canon U.S.A., Inc., a subsidiary of Canon Inc. (NYSE: CAJ), today announced that its semiconductor production equipment group has started accepting orders for its newest 300 mm-compatible lithography tool set -- the FPA-5000AS3 ArF scanner, FPA-5000ES4 KrF scanner and FPA-5500iX i-line stepper.

"The timely introduction of this new tool set allows our customers to move quickly to the 100 nm node, using either 200 mm or 300 mm wafers," said Naoki Ayata, vice president and general manager, semiconductor equipment division, Canon U.S.A. Mr. Ayata said the configuration of the new tool set offers users greater flexibility with increased productivity. Combined as a mix-match solution, the Canon tool set can be optimized for production of all IC device types, including the emerging SoC devices.

The 193 nm Canon FPA-5000AS3 scanner, which incorporates high-purity calcium fluoride lens technology within its projection optics system, features a newly developed low aberration 4:1 reduction projection lens with a high 0.75 NA (numerical aperture). The combination permits world-leading production resolution levels of 0.1 micron and below for the high-contrast, low-distortion exposure of very critical IC layers.

The 248 nm FPA-5000ES4 scanner, with an extremely low aberration 4:1 reduction 0.80NA projection lens, realizes ultra-high-resolution 0.12-micron patterning. Within the same compact footprint as its ES3 predecessor, the ES4's platform incorporates several features that enhance overlay and CD uniformity.

In both new scanner models, precisely synchronized high-acceleration reticle and wafer stages realize overlay alignment accuracy of less than 20 nm while moving 350 mm per second -- the fastest in the industry. This enables the FPA-5000AS3 and FPA-5000ES4 to achieve throughput rates of approximately 105 and 110 wph, respectively, on 300 mm wafers, and 160 wph each on 200 mm wafers.

The Canon FPA-5500iX i-line stepper, for less critical-layers, has a newly developed 2x reduction ratio and 0.37 NA lens for imaging a 50 mm x 50 mm single-exposure image field. Used with a 4.5kW ultra-high-pressure mercury lamp, the tool accommodates throughputs of 120 wph on 300 mm, and 160 wph on 200 mm wafers. The new i-line model is a mix-and-match companion for the two new scanners.

"We anticipate that having a very high throughput, low cost of ownership i-line stepper to complement our scanners will continue to help boost our tool set sales," said Mr. Ayata. "The FPA-5500iX i-line stepper is a vital part of the tool set because i-line still accounts for about half the lithography tool market."

Mr. Ayata noted that during a market crunch, mix-and-match is a proven way to reduce the cost of less critical layers, meaning 350 nm and above. Delivery of the new tool set has been slated to begin 2Q-3Q2002.

All three new Canon lithography tools, compatible with reticle SMIF as well as automation features increasingly required for 300 mm manufacturing processes, enable the creation of a mini-environment for improved reticle contamination control, more efficient use of clean room space and higher productivity.

"We have our new Optron CaF2 lens material plant and tool manufacturing capacity for 600 units per year in place, ready for capacity orders to start to build," said Mr. Ayata. "Canon tool sets have been selected by over 60 percent of the 300 mm fabs that have come on line since 2000, and Canon stepper and scanner sales have remained strong during 2001."

The semiconductor equipment division of Canon U.S.A., based in San Jose, California, supplies step-and-repeat and step-and-scan photolithography tools for making integrated circuits including MR and GMR thin film heads for hard disk drives, and large active matrix liquid crystal flat panel displays.

Canon U.S.A., Inc. is an industry leader in professional and consumer imaging solutions and, through its parent company, Canon Inc., is a top patent-holder of imaging technologies. Canon employs 12,000 people at more than 30 facilities throughout North, Central and South America and the Caribbean.

Canon Inc., comprising all Canon Group operations, is a $24-billion company with 78,000 employees. Headquarters are in Tokyo, Japan, with approximately 80 sales companies, manufacturing companies and R&D centers worldwide.

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