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CD-SEM shape-sensitive linewidth measurement final report submitted.


The final report for a one-year project to apply a model-based library (MBL MBL Mobile
MBL Marine Biological Laboratory
MBL Macquarie Bank Limited
MBL Mannose-Binding Lectin
MBL Marine Boundary Layer
MBL Member Business Lending (credit unions)
MBL Movimiento Bolivia Libre
) method to measurements performed with critical dimension scanning electron microscopes scan·ning electron microscope
n. Abbr. SEM
An electron microscope that forms a three-dimensional image on a cathode-ray tube by moving a beam of focused electrons across an object and reading both the electrons scattered by the object and
 (CD-SEMs) has been submitted to International SEMATECH SEMATECH Semiconductor Manufacturing Technology . CD-SEM CD-SEM Critical Dimension - Scanning Electron Microscopy  images of linewidth test patterns were analyzed to determine the lines' widths and the angles of their edges. The patterns were subsequently cross-sectioned and imaged again. Comparison of the MBL and cross section results revealed differences of approximately 6 nm for widths and 1[degrees] for sidewall angles. These differences are considered small enough that they may be accounted for by line edge roughness and uncertainty in matching the location of the cross section to the location of the CD-SEM image.

CONTACT: John Villarrubia, (301) 975-3958; john.villarrubia@nist.gov.
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Title Annotation:General Developments
Publication:Journal of Research of the National Institute of Standards and Technology
Article Type:Brief Article
Date:May 1, 2003
Words:121
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