Bruce Technologies broadens product line with new horizontal furnace for 200MM wafers; Leading semiconductor equipment supplier gives customers an economical alternative for 200mm wafer processing.NORTH BILLERICA, Mass.--(BUSINESS WIRE)--July 1, 1996-- Bruce Technologies International, a leading supplier of advanced horizontal and vertical furnaces and process control software to semiconductor manufacturers, today announced the addition of the BDF-200 to its horizontal furnace furnace, enclosed space for the burning of fuel. There are many kinds of furnaces, the type depending upon the fuel and the use to which the heat produced within it is put. Most familiar are the furnaces used in the heating of buildings. product line. The BDF-200 is the semiconductor industry's only horizontal furnace specifically optimized for 200mm wafer (1) A small, thin continuous-loop magnetic tape cartridge that has been used from time to time for data storage and specialized applications. (2) The base unit of chip making. It is a slice taken from a salami-like silicon crystal ingot up to 12" (300mm) in diameter. processing. "The BDF-200 is a key addition to our product line," says Bob McAuliffe, President of Bruce. "As an increasing number of semiconductor and wafer manufacturers migrate to 200mm wafer processing, Bruce Technologies is pleased to offer a product that provides excellent performance with a low cost of ownership. We have already received an order from a major chip maker and have interest from several major silicon wafer manufacturers for the product." Product manager Tim Stack added that economics is driving some chip makers and silicon wafer manufacturers to move to 200mm wafers wafers compressed roughage in flat plates useful for feeding to animals in transit. , but that these companies don't always need more sophisticated and expensive vertical furnaces for their wafer processes. "This product is specifically designed for semiconductor and silicon wafer manufacturers who need high throughput on larger wafers," said Stack. Bruce currently holds approximately 50% of the worldwide market share for horizontal furnaces for semiconductor manufacturers. Bruce introduced the industry=92s first horizontal furnace for 200mm wafers some ten years ago,= at the request of a leading-edge customer. When vertical furnace technology was introduced as state-of-the-art for 200mm wafer processing, demand for 200mm horizontal furnaces leveled off. =93Now, customers are realizing that for certain types of chips with large features, they can process more wafers at a lower cost with horizontal furnaces,=94 explained McAuliffe. Features and functions The BDF-200 horizontal furnace is capable of performing atmospheric and LPCVD LPCVD Low Pressure Chemical Vapor Deposition films on 200mm silicon wafers in batches as large as 150 wafers per load at a temperature range from 400 to 1350 degrees Centigrade centigrade /cen·ti·grade/ (sen´ti-grad) having 100 gradations (steps or degrees); see under scale. cen·ti·grade adj. Celsius. . It can be purchased utilizing varying degrees of automation ranging from boatloaders and stand alone elevators to Bruce=92s RTS-1=D4 cassette-to-cassette= automation package. The product contains three separate process chambers that are packaged in a small system footprint The amount of geographic space covered by an object. A computer footprint is the desk or floor surface it occupies. A satellite's footprint is the earth area covered by its downlink. See form factor. 1. . It has provisions to accommodate both cantilever and softlander boatloading designs for reduced particle generation, an L-shaped gas cabinet that includes easy quartz tube removal, and a vertical gas system layout for easy component accessibility. The BDF-200 is also compatible with Bruce=92s APEX apex (a´peks) pl. apexes, a´pices [L.] tip; the pointed end of a conical part; the top of a body, organ, or part.ap´ical apex of lung the rounded upper extremity of either lung. =D4 supervisory system. Recognized as the industry's model for diffusion diffusion, in chemistry, the spontaneous migration of substances from regions where their concentration is high to regions where their concentration is low. Diffusion is important in many life processes. cell management, APEX is specifically designed to manage the diffusion manufacturing process by providing up-to-date reports of data, and creating or modifying recipes containing variables and parameters for processing. Bruce Technologies International is a leading supplier of furnace technology and process control software to semiconductor manufacturers. The Company manufactures state-of-the-art horizontal and vertical diffusion/LPCVD furnaces which layer films for circuitry onto the surface of a silicon wafer during chip making, and also offers the most advanced process control software available. Founded in 1992, Bruce Technologies is a wholly-owned subsidiary of Kokusai Electronic Co. Ltd. of Japan. An engineering-driven company known for its technological achievements, Bruce pioneered the first integrated software Separate software components or applications that have been combined into one package. See integrated software package. systems for chip furnaces and was the first furnace maker to utilize CAD software in designing its equipment. -0- APEX, BDF-200 and Bruce Technologies are trademarks of Bruce Technologies International, Inc. All other trademarks contained herein are the property of their respective owners. CONTACT: Tim McCarthy Timothy J. McCarthy (born c. 1949) is the police chief of Orland Park, Illinois but is most famous for leaping in front of US President Ronald Reagan to stop one of John Hinckley, Jr.'s .22 caliber bullets on March 30, 1981 (see Reagan assassination attempt for details). OR Kerry Bard bard, in Wales, term originally used to refer to the order of minstrel-poets who composed and recited the poems that celebrated the feats of Celtic chieftains and warriors. or Sean Kegelman Bruce Technologies Int. Schwartz Communications, Inc. 508/670-5501 617/431-0770 |
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