Breakthrough in sub-10 nm nanofabrication in silicon. (News Briefs).NIST (National Institute of Standards & Technology, Washington, DC, www.nist.gov) The standards-defining agency of the U.S. government, formerly the National Bureau of Standards. It is one of three agencies that fall under the Technology Administration (www.technology. researchers in the atom-based dimensional metrology  This article or section may be confusing or unclear for some readers.Please [improve the article] or discuss this issue on the talk page. project made a significant breakthrough in the processing and fabrication fabrication (fab´rikā´sh  n),n the construction or making of a restoration. of atomically flat and ordered silicon surfaces. The researchers have written features of critical dimensions as small as 10 nm in silicon. This process has now been repeated several times and can be considered a controlled process. This work is focused on developing the means to perform nanometer-scale surface modifications reproducibly and to develop new metrology methods for calibration and characterization on the nanometer scale. These recent developments involved the controlled desorption Desorption A process in which atomic and molecular species residing on the surface of a solid leave the surface and enter the surrounding gas or vacuum. and breaking of hydrogen surface bonds to create stable structures where complex forms and even words can be written in a space of only 100 nm. CONTACT: Richard Silver, (301)975-5609; richard.silver@nist.gov. |
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