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Bell Labs Research May Extend Life Expectancy of Silicon-based Transistor Technology.


MURRAY HILL Murray Hill may refer to one of the following places:
  • Murray Hill, Kentucky
  • Murray Hill, Manhattan, a residential neighborhood in New York City
  • Murray Hill, Queens, a different locality in New York City
  • Murray Hill, New Jersey
  • Murray Hill, Pennsylvania
, N.J.--(BUSINESS WIRE)--June 23, 1999--

The mainstay of the semiconductor revolution -- silicon-based transistor technology - may not run out of steam for roughly a dozen years, instead of the previous estimate of fewer than six years, report researchers at Lucent Technologies' Bell Labs in the June 24 issue of Nature.

In recent years, the Years, The

the seven decades of Eleanor Pargiter’s life. [Br. Lit.: Benét, 1109]

See : Time
 semiconductor industry thought a limiting factor A factor or condition that, either temporarily or permanently, impedes mission accomplishment. Illustrative examples are transportation network deficiencies, lack of in-place facilities, malpositioned forces or materiel, extreme climatic conditions, distance, transit or overflight rights,  for producing increasingly smaller silicon-based transistors would be the crucial insulating layer. Made of silicon dioxide silicon dioxide: see silica.


(SiO2) A hard, glassy mineral found in such materials as rock, quartz, sand and opal. In MOS chip fabrication, it is used to create the insulation layer between the metal gates of the top layer and the silicon elements below.
, the insulating layer on today's chips is typically 25 atoms thick, but the Bell Labs researchers have produced a five-atom-thick layer, the thinnest ever made. They also showed that a four-atom layer is the fundamental physical limit for silicon dioxide-based insulators.

The research results suggest that an alternative insulating material must be found before 2012. Or, if alternative insulating materials are not found, totally new semiconductor technologies will be needed.

"Having extended the fundamental physical limits of silicon dioxide gives the semiconductor industry more time to develop alternative insulating layers," said Bell Labs researcher David Muller, who used the most sophisticated electron microscopy electron microscopy

Technique that allows examination of samples too small to be seen with a light microscope. Electron beams have much smaller wavelengths than visible light and hence higher resolving power.
 technique available today to confirm the thickness results.

The insulating layer, known as the gate oxide, is the device's smallest feature. It lies between the transistor's gate electrode, which turns current flow on and off, and the channel through which this current flows. The gate oxide acts as an insulator by protecting the channel from the gate electrode, thus preventing a short circuit.

By continually reducing both the gate oxide thickness and the length of the gate electrode, the semiconductor industry has doubled the transistor's switching speed every 18 to 24 months, following what is known as Moore's Law "The number of transistors and resistors on a chip doubles every 18 months." By Intel co-founder Gordon Moore regarding the pace of semiconductor technology. He made this famous comment in 1965 when there were approximately 60 devices on a chip. .

"Bell Labs research on ultrathin ul·tra·thin  
adj.
Very thin.
 gate oxides is delivering technology advances that we are applying to new generations of communications ICs," said Mark Pinto, chief technology officer for Lucent's Microelectronics Group. "These advances will enable us to provide system-on-a-chip capabilities with more performance and lower power consumption for such demanding applications as third-generation wireless systems."

To produce the ultrathin gate oxide, it was essential to "grow" atomic layers that were absolutely uniform and smooth. That's because the top and bottom layers were adjacent to the silicon itself, leaving only three layers in between. All three of the middle layers needed to be completely intact to prevent electrons from escaping through the gate oxide, which would lead to a short circuit.

Tackling the gate oxide challenge, researcher Greg Timp Gregory Timp is a professor of electrical engineering at the University of Illinois at Urbana-Champaign.

Gregory Timp received his Ph.D. in Electrical Engineering from the Massachusetts Institute of Technology in 1984 under the direction of Mildred Dresselhaus.
 and his Bell Labs colleagues first cleaned the silicon and then used an unconventional process to add oxygen to the silicon to grow silicon dioxide. They used a process known as rapid thermal oxidation In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer (semiconductor). The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. , which exposes the silicon to 1,000 degrees Celsius for 10 seconds.

To study the resulting gate oxide, which was later incorporated into a working transistor, Muller used a scanning transmission electron microscope electron microscope: see microscope. . This analytical technique An analytical technique is a method that is used to determine the concentration of a chemical compound or chemical element. There are a wide variety of techniques used for analysis, from simple weighing (gravimetric) to titrations (titrimetric)to very advanced techniques using  pinpoints individual atoms, examines how they bind to each other and also determines their electrical properties, which indicate insulating characteristics.

Because the Bell Labs findings are based on only research results, reliability and yield issues still must be explored before using these ultrathin gate oxides in a manufacturing setting.

Other Bell Labs researchers working on the project included Thomas Sorsch, Stephen Moccio, Frieder Baumann, and Kenneth Evans-Lutterodt. A portion of the microscopy research was done at Cornell University's Center for Materials Research.

Lucent Technologies, headquartered in Murray Hill, N.J., designs, builds and delivers a wide range of public and private networks, communications systems and software, data networking systems, business telephone systems and microelectronics components. Bell Laboratories is the research and development arm for the company. For more information on Lucent Technologies, visit the company's web site at http://www.lucent.com or the Bell Labs web site at http://www.bell-labs.com.
COPYRIGHT 1999 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 1999, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Publication:Business Wire
Geographic Code:1USA
Date:Jun 23, 1999
Words:632
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