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Aviza Technology Introduces New Low Temperature Silicon Nitride Process; New Satin Process Aimed at Sub-90nm DRAM and Logic IC Manufacturing.


SCOTTS VALLEY, Calif. -- Aviza Technology, a leading supplier of production-proven thermal process systems and an industry innovator in atomic layer deposition A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century.  (ALD ALD
abbr.
adrenoleukodystrophy


ALD,
n.pr See adrenoleukodystrophy.


ALD

aldolase.
), today introduced Satin(TM), a low pressure chemical vapor deposition Vapor deposition

Production of a film of material often on a heated surface and in a vacuum. Vapor deposition technology is used in a large variety of applications.
 (LPCVD LPCVD Low Pressure Chemical Vapor Deposition ) process for depositing silicon nitride (SiN) at approximately 500 degrees C, an important capability for sub-90 nm semiconductor manufacturing. Satin's unique chemical characteristics, coupled with Aviza Technology's RVP-500 platform, achieve the thermal budget requirements for 90 nm and below device features. The RVP-500 combines the advantages of the reduced cycle times offered by single wafer tools and the lower cost of ownership (CoO) associated with batch furnaces.

The Satin process incorporates a proprietary precursor that eliminates the problems of chlorine (Cl) or carbon contamination in the SiN film and potential plasma damage. Air Liquide supplied the precursor material and worked with Aviza Technology to jointly develop the process.

"Satin, developed specifically for implementation on our RVP-500 platform, is a major step forward in advanced thermal processing," said May Su, vice president and general manager of Aviza Technology's thermal business unit. "Advancements such as lower chemical consumption rates to reduce process cost, cross flow capability and the flexibility to run variable load sizes up to 50 wafers underscore Aviza Technology's commitment to providing our global customers with advanced process solutions and high-productivity systems that drive down CoO."

Satin's near 500 degrees C process temperature is an important breakthrough for IC manufactures of logic, DRAM, flash, NAND (Not AND) A Boolean logic operation that is true if any single input is false. Two-input NAND gates are often used as the sole logic element on gate array chips, because all Boolean operations can be created from NAND gates. See flash memory.  and NOR devices at the 90 nm node and below. Sub-90 nm devices are facing severe demands for lower thermal budgets due to presence of advanced metal gates, nickel silicide sil·i·cide  
n.
A compound of silicon with another element or radical.

Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical
 and shallow junctions. The traditional dichlorosilane (DCS (1) See also DSC.

(2) Digital Cross-connect System) A network switching and grooming device used by telecom carriers. See digital cross-connect.
) ammonia (NH3) process for silicon nitride film deposition temperatures requires temperatures above 630 degrees C. Newer bis tertiary-butylamino silane silane
 or silicon hydride

Any of a series of inorganic compounds of silicon and hydrogen with covalent bonds and the general chemical formula SinH(2n + 2).
 (BTBAS) / NH3 process temperatures are at 570 degrees C or above. Both of these current processes inherently restrict ability to meet today's modern thermal budget, contamination and reduced plasma damage requirements for sub-90 nm film formation.

About Aviza Technology, Inc.

Aviza Technology, a privately held company privately held company

A firm whose shares are held within a relatively small circle of owners and are not traded publicly.
, is a leading supplier of thermal processing, low-pressure chemical vapor deposition and atomic layer deposition solutions to the global semiconductor industry. The company maintains a worldwide installed base of more than 2,500 tools. Aviza Technology's headquarters, manufacturing and R&D facilities are located in Scotts Valley, Calif. Additional sales and customer support facilities are located in Germany, France, Scotland, Taiwan, China, Japan, Singapore and Malaysia. Aviza Technology employs 500+ people worldwide. Additional information can be found at www.avizatechnology.com.

Note: The "3" in "NH3" should be subscript.
COPYRIGHT 2004 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2004, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Publication:Business Wire
Date:Nov 29, 2004
Words:429
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