Aviza Technology Introduces Atomic Layer Deposition Batch System for High-K Dielectric Films; Innovative System Targets Advanced Films for Rapidly Emerging ALD Market.

SCOTTS VALLEY, Calif. -- Aviza Technology, a leading supplier of production-proven thermal process systems and an industry innovator in atomic layer deposition (ALD), today introduced the semiconductor industry's first batch wafer process ALD system that demonstrates uniformity equal or superior to single wafer processing in the deposition of high-k capacitor dielectric films such as Al2O3, HfO2 and HfSiOx. The Verano(TM) 5000, a 300mm, mini-batch ALD system, is capable of meeting the nano-scale processing and high-productivity requirements of high-volume applications while offering the quick turnaround time (QTAT) of the mini-batch concept. Batch sizes can vary from 1-50 wafers (without the use of filler wafers). It is also available with an optional six-FOUP stocker.

The Verano 5000 offers features such as fast temperature ramping, isothermal chamber, cross flow precursor injection, boat rotation and advanced temperature control (ATC). The result is dramatically improved throughput and process uniformity with reduced cycle times. In addition, its side-by-side installation requires minimal clean room space, providing significant savings in 300mm production line installation. Aviza Technology's patent-pending process, Cross Injection(TM), provides gas flow in parallel to the wafer surface via an injector orifice and exiting through an exhaust slot.

"The Verano 5000 exemplifies our commitment to a productivity driven and flexible ALD solution for our customers worldwide," said Subrata Chatterji, vice president and general manager of the ALD business unit. "The batch wafer processing capability provides superior wafer-to-wafer uniformity, irrespective of load capacity. This is truly a unique productivity achievement for our customers that require HfO2 and HfSiOx films for high volume applications."

ALD is widely expected to be one of the fastest growing equipment segments over the next five years. According to the latest data from VLSI Research, the market for ALD systems for semiconductor applications is expected to grow from $290 million in 2004 to over $750 million by 2008.

"Process equipment and process solutions capable of overcoming next generation interconnect schemes continue to drive Aviza Technology to provide revolutionary solutions," said Executive Vice President for Technology and Strategic Marketing Jeff Kowalski. "Our company is committed to a product strategy that delivers a 'Complete ALD Solution,' including both batch and single wafer ALD systems for our global customers."

About Aviza Technology, Inc.

Aviza Technology, a privately held company, is a leading supplier of thermal processing, low-pressure chemical vapor deposition and atomic layer deposition solutions to the global semiconductor industry. The company maintains a worldwide installed base of more than 2,000 tools. Aviza Technology's headquarters, manufacturing and R&D facilities are located in Scotts Valley, Calif. Additional sales and customer support facilities are located in Germany, France, Scotland, Taiwan, Japan, Singapore and Malaysia. Aviza Technology employs approximately 500 people worldwide. Additional information can be found at www.avizatechnology.com.