Asahi Glass Introduces New CMP Slurry for Copper Interconnects with New-level Planarization Performance.Tokyo, Japan, Dec 5, 2006 - (JCN JCN Japan Corporate News JCN Journal of Cognitive Neuroscience JCN Journal of Cardiovascular Nursing JCN Journal of Christian Nursing JCN Job Control Number JCN Journal of Child Neurology JCN joint communications network (US DoD) ) - Asahi Glass announced a new CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information (Chemical Mechanical Polishing) slurry slurry, n a thin mixture of insoluble material floating in liquid. slurry solids in suspension. Used as a method of feeding pigs—slurry is pumped through fixed lines and delivered to troughs by hoses equipped with gasoline pump fittings. for copper interconnects on December 5. The product, called 'Applanador', generates minimal dishing (a dent on the interconnect (1) To attach one device to another. (2) A physical port (plug, socket) or wireless port (transmitter, receiver) used to attach one device to another. ) caused by copper CMP during the production process of copper interconnects for semiconductor integrated circuits Integrated circuits Miniature electronic circuits produced within and upon a single semiconductor crystal, usually silicon. Integrated circuits range in complexity from simple logic circuits and amplifiers, about 1/20 in. (1. . Traditional products create dishing of about 500 angstroms during the polishing process, so a thick coating must be placed over the copper to secure proper interconnect thickness. Actually dishing itself has been a critical factor that has drastically lowered the yield rate. As a result, we posted high production costs. The new Asahi Glass product will enable us to make the copper coating thinner and reduce processing times for both coating and CMP. Moreover with only minimal dishing, we expect a remarkable improvement in the yield rate as well as a radical decline in production costs for semiconductor integrated circuits. Asahi Glass will begin distributing samples in December 2006 and start mass production in 2007. The company hopes attaining a minimum of 25% of the global share in the market for CMP slurries for copper interconnects by 2010, and is opening a new office in Taiwan as well as current offices in Japan, Europe and America, Shanghai, a Singaporean office. Copyright [c] 2006 Japan Corporate News Network. All rights reserved. |
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