Applied NanoWorks Announces Pinnacle Nano-Oxides, high performance CMP abrasives.WATERVLIET, N.Y. -- New alumina, silica, ceria and zirconia nano-oxides deliver sub-10nm real particle sizes for CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information performance applications Applied NanoWorks, Inc. today announced the immediate availability of PinnacleAF Nano-Oxides, a family of four oxide abrasives that deliver tight size distributions below 10nm in a water suspension. Nano-abrasives are used in Chemical Mechanical Polishing (CMP) processes for semiconductor integrated circuit integrated circuit (IC), electronic circuit built on a semiconductor substrate, usually one of single-crystal silicon. The circuit, often called a chip, is packaged in a hermetically sealed case or a nonhermetic plastic capsule, with leads extending from it for manufacture. Smaller abrasive particle sizes enable the semiconductor industry to maintain quality control while shrinking the size of their chip designs in the drive to lower cost per computer chip. "PinnacleAF Nano-Oxides establishes a new benchmark for slurry and pad production in the CMP market and is an important development for the newer chip fab technologies." said Eric Burnett, president & CEO (1) (Chief Executive Officer) The highest individual in command of an organization. Typically the president of the company, the CEO reports to the Chairman of the Board. of Applied NanoWorks. "These production results are actual particle sizes, not the primary particle sizes commonly quoted in the industry." "As industry demands better performance from CMP technologies, high quality, smaller particle materials of controlled size distribution are critical." Said Om Nalamasu, Director of Rennselaer Polytechnic Institute's Center for Integrated Electronics and a previous director of R&D at Bell Labs. The Pinnacle AF Nano-Oxides are all below 10nm and include: Aluminum Oxide aluminum oxide: see alumina. (Al2O3), Silicon Dioxide silicon dioxide: see silica. (SiO2) A hard, glassy mineral found in such materials as rock, quartz, sand and opal. In MOS chip fabrication, it is used to create the insulation layer between the metal gates of the top layer and the silicon elements below. (SiO2), Cerium cerium (sēr`ēəm) [from the asteroid Ceres], metallic chemical element; symbol Ce; at. no. 58; at. wt. 140.12; m.p. 799°C;; b.p. 3,426°C;; sp. gr. 6.77 at 25°C;; valence +3 or +4. Dioxide (CeO2) and PinnacleAF Zirconium zirconium (zərkō`nēəm), metallic chemical element; symbol Zr; at. no. 40; at. wt. 91.22; m.p. about 1,852°C;; b.p. 4,377°C;; sp. gr. 6.5 at 20°C;; valence +2, +3, or +4. Dioxide (ZrO2). All materials are available in a range of volumes starting at 100ml with a 20% loading. According to Business Communications Corp, the CMP nanopowders market was well over $120M in 2003 and is growing at over 20% per year. The entire CMP market in the same year was estimated at over $440M. "Our ability to produce amorphous and crystalline materials will give our partners a single source access to the best slurry materials available today." CTO (Chief Technical Officer) The executive responsible for the technical direction of an organization. See CIO and salary survey. Partha Dutta, Phd, stated. "With our production platform well established, we will now focus on the increasing the value of our products for the CMP market." Applied NanoWorks provides high quality nanomaterials and materials research services to meet both industrial research and manufacturing needs. Its' proprietary technology offers high quality semiconductor, metal and oxide nanomaterials ranging from 2nm to 100nm and are available in volumes ranging from research quantities to high volume purchasing and production agreements. Visit the company's web site at http://www.appliednanoworks.com. |
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