Applied Materials Unveils New Photomask Etch System to Enable Nanometer Chip Generations.Business Editors/High-Tech Writers NOTE TO MEDIA: Photo is available in a Smart News Release(TM) on Business Wire's Home Page at www.businesswire.com and at www.newstream.com SANTA CLARA Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif.--(BUSINESS WIRE)--Sept. 27, 2001 Tetra(TM) Photomask Etch System Expands Etec's Total Solutions(TM) Approach for Advanced Maskmaking Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc., the leading supplier of etch systems to semiconductor manufacturers, along with its Mask Business Sector subsidiary, Etec Systems, Inc., introduce the Tetra(TM) Photomask Etch system, the industry's most advanced etch system for fabricating photomasks. The Tetra system uses dry plasma technology for etching binary masks, as well as the higher-resolution phase-shift and optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. masks used by lithography systems to print nanometer-generation chip designs. Multiple systems have already been shipped to customers in Europe and the U.S., and several repeat orders have been received for the system for delivery in 2001. Steve Carlson, senior vice president of technology at Photronics, Inc. said, "Our first Tetra production system demonstrated dramatically lower defect levels compared to other technologies. This remarkable yield improvement translates to a significant cost savings for us. The system's superior process results and reliability add a new dimension of production capability to enable sub-130nm masks." "The Tetra system is supported by a dedicated photomask technology group and expands Etec's Total Solutions approach to advanced production maskmaking," said Howard Neff, president of Etec Systems. "This solution also includes the new MEBES(R) eXara(TM) electron-beam pattern generation system, the ALTA(R) 4000 laser-based system, and the ARIS ARIS American Religious Identification Survey ARIS Architecture of Integrated Information Systems ARIS Active Rack Isolation System ARIS Aggregate Route-based IP Switching ARIS Agentia Romana pentru Investitii Straine (TM)100i mask defect inspection system. The combination of these world-class systems provides our customers with a pre-qualified and integrated solution that can potentially reduce their cycle time for the most demanding advanced mask processing applications." Based on Applied Materials' award-winning decoupled plasma source Plasma sources generate plasmas. Excitation of a plasma requires partial ionisation of neutral atoms and/or molecules of a medium. There are several ways to cause ionisation: collisions of energetic particles, strong electric fields acting on bond electrons, or ionising (DPS Minicomputer series from Bull HN. 1. (language, text) DPS - Display PostScript. 2. (language) DPS - A real-time language with direct expression of timing requests. ["Language Constructs for Distributed Real-Time PRogramming", I. ) technology, the Tetra offers the complete production capability required for 100nm and beyond maskmaking technology and productivity. For exceptional defect performance, the system features patented technology that limits reticle ret·i·cle n. A grid or pattern placed in the eyepiece of an optical instrument, used to establish scale or position. [Latin r contact to the outer backside edge and eliminates moving parts Moving parts are the components of a device that undergo continuous or frequent motion, most commonly rotation. "Parts" only include the mechanical components which does not include fuel, or any other gas or liquid. above the mask. Its proven etch processes also contribute to outstanding CD (critical dimension) control and etch rate uniformity for precise mask patterning. In production environments, the Tetra system can achieve over 90 percent uptime, providing a significant improvement over competing technologies. "The Tetra system takes full advantage of the superior etch performance that has made Applied Materials the market leader in semiconductor etching, with extensive development work to create the industry's most capable system for the next several generations of advanced photomasks," said Jian Ding, general manager of Applied Materials' Photomask Processing Group. "This system enables the technology and productivity our customers need to manufacture 100nm-generation masks, while accelerating their development of 70nm generations and beyond." The system's field-proven Centura platform, which is similar to those used in hundreds of Applied Materials' semiconductor installations, supports up to four etch chambers. Customers can have chambers dedicated to chrome, quartz and MoSi (molybdenum molybdenum (məlĭb`dənəm) [Gr.,=leadlike], metallic chemical element; symbol Mo; at. no. 42; at. wt. 95.94; m.p. about 2,617°C;; b.p. about 4,612°C;; sp. gr. 10.22 at 20°C;; valence +2, +3, +4, +5, or +6. silicide sil·i·cide n. A compound of silicon with another element or radical. Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical ) etch on one platform, with space for a fourth chamber for future applications. Thus, one system can provide all of the mask etch applications required by many maskmakers, with high uptime. Mask manufacturers using the Tetra system can take advantage of Applied Materials' expertise gained from an installed base of hundreds of etch systems, as well as the company's renowned global support organization for maximum uptime and availability virtually anywhere mask manufacturers are located. Applied Materials (Nasdaq:AMAT AMAT Applied Materials (stock symbol) AMAT Average Memory Access Time AMAT Automatic Message Accounting Transmitter AMAT Anti-Materiel (bomb or mine) AMAT Ageing Management Assessment Team ), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is http://www.appliedmaterials.com. Note: A Photo is available at URL URL in full Uniform Resource Locator Address of a resource on the Internet. The resource can be any type of file stored on a server, such as a Web page, a text file, a graphics file, or an application program. : http://www.businesswire.com/cgi-bin/photo.cgi?pw.092701/bb2 |
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