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Applied Materials Shatters Metrology Roadblocks for 65-45nm Production with Applied VeritySEM System.


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http://www.businesswire.com/cgi-bin/mmg.cgi?eid=4577686

SANTA CLARA Santa Clara, city, Cuba
Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba.
, Calif.--(BUSINESS WIRE)--Feb. 23, 2004

Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc. (Nasdaq:AMAT AMAT Applied Materials (stock symbol)
AMAT Average Memory Access Time
AMAT Automatic Message Accounting Transmitter
AMAT Anti-Materiel (bomb or mine)
AMAT Ageing Management Assessment Team
) extends its leadership in CD-SEM CD-SEM Critical Dimension - Scanning Electron Microscopy (a) technology with the new high-throughput Applied VeritySEM(TM) Metrology system. Proprietary new SEM technology enables a remarkable less than 5 angstrom angstrom (ăng`strəm), abbr. Å, unit of length equal to 10−10 meter (0.0000000001 meter); it is used to measure the wavelengths of visible light and of other forms of electromagnetic radiation, such as ultraviolet  precision for tightly controlling ArF(a) resist structures, line edge roughness and feature shape in 65-45nm device structures. Multiple VeritySEM systems can be matched both internally and between fabs to within one nanometer. As a result of these advancements, customers' cost of ownership is reduced by one-third over any other CD-SEM system on the market.

"Customers moving to next-generation devices face imposing technical and process control challenges, along with the need to streamline WIP WIP Work In Progress
WIP Work in Process
WIP World Internet Project
WIP Women in Prison (movie genre)
WIP World Institute of Pain
WIP Wash-In-Place
WIP Women in Publishing
WIP Work In Place
WIP Wireless Internet Protocol
(a) in 300mm fabs," said Dr. Gilad Almogy, vice president and general manager of Applied Materials' Process Diagnostics and Control group. "We've had very exciting results from customers using the Applied VeritySEM system. Customers in 65nm development have reported major improvements in their ability to control critical lithography and etch processes, while those using the system in a production environment are realizing significant throughput advantages."

The VeritySEM system's new SEM technology provides less than 1.8nm resolution at ultra low voltages (200eV) and large field-of-view scanning with no distortion, enabling the measurement of gate and ArF features with less than 5 angstrom precision -- a requirement for 45nm device production. An innovative variable beam current control module improves the signal to noise ratio and enables faster and more robust recipe automation, resulting in significantly higher throughput in production.

Multiple installations of Applied VeritySEM systems are in production fabs and development centers in Asia, North America North America, third largest continent (1990 est. pop. 365,000,000), c.9,400,000 sq mi (24,346,000 sq km), the northern of the two continents of the Western Hemisphere.  and Europe, including several new customer penetrations. Additional shipments are scheduled and customer demand for systems is gaining momentum.

Applied Materials, Inc. (Nasdaq:AMAT) is the largest supplier of equipment and services to the global semiconductor industry. Applied Materials' Web site is http://www.appliedmaterials.com.


(a) CD-SEM: critical dimension -- scanning electron microscope
    ArF: argon fluoride
    WIP: wafers in process


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Publication:Business Wire
Geographic Code:1USA
Date:Feb 23, 2004
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