Applied Materials Launches Advanced Cobalt Solution for Nano-Chip Manufacturing.Business Editors/High-Tech Writers NOTE TO MEDIA: Photo is available in a Smart News Release(TM) on Business Wire's Home Page at www.businesswire.com and at www.newstream.com SANTA CLARA Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif.--(BUSINESS WIRE)--Dec. 4, 2001 New ALPS Alps, great mountain system of S central Europe, c.500 mi (800 km) long and c.100 mi (160 km) wide, curving in a great arc from the Riviera coast on the Mediterranean Sea, along the borders of N Italy and adjacent regions of SE France, Switzerland, SW Germany, and (TM) (Advanced Low Pressure Source) Cobalt Chamber Extends Company's Leadership in PVD PVD abbr. peripheral vascular disease PVD Peripheral vascular disease, see there Silicide sil·i·cide n. A compound of silicon with another element or radical. Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical Technology to Sub-130nm Chips Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc., the leading supplier of PVD (physical vapor deposition  This article or section is in need of attention from an expert on the subject.Please help recruit one or [ improve this article] yourself. See the talk page for details. ) silicide technology to the semiconductor industry, announces its new Endura(R) ALPS Co solution for depositing cobalt silicide films in transistor gate and contact structures of advanced logic and memory devices. The superior bottom coverage achieved by the proprietary, production-worthy ALPS Co process allows chipmakers to extend cost-effective PVD silicide technology well below the 130nm device generation. "Applied Materials' new ALPS Co chamber takes advantage of many new hardware design elements to achieve the kind of breakthrough silicide performance our customers require for their most advanced devices," said Dr. Fusen Chen, vice president and general manager of Applied Materials' Cu, Al Systems and Modules Product Group. "Since the chamber is integrated on the industry-standard Endura mainframe, customers are assured of proven PVD manufacturability and reliability, as well as the capability to upgrade existing chambers for next generation technology. The chamber is already installed at multiple customer sites where it is being used to enable the most advanced logic and memory chips." Cobalt has become the preferred liner film for gate and contact structure applications since it provides low resistivity resistivity Electrical resistance of a conductor of unit cross-sectional area and unit length. The resistivity of a conductor depends on its composition and its temperature. independent of shrinking linewidths. The new ALPS Co process chamber extends cobalt film technology well beyond 130nm manufacturing by providing the critical bottom coverage necessary for enabling these structures. Optimized target-to-wafer spacing enables greater than 70% bottom coverage on 2.5:1 aspect ratio (AR) transistor gates and greater than 10% coverage in 6:1 AR contacts. The chamber also features a low temperature electrostatic chuck for precise wafer temperature control. Applied Materials' 200mm ALPS Co chamber is based on the company's proven ALPS Aluminum chamber technology and is easily scalable to 300mm manufacturing. The chamber is integrated on Applied Materials' proven Endura platform with an in-situ preclean chamber and a titanium/titanium nitride capping layer chamber for superior film quality and maximum production throughput. Existing PVD silicide chambers currently in use at chipmakers around the world can also be upgraded to ALPS Co technology for next generation manufacturing. Applied Materials (Nasdaq:AMAT AMAT Applied Materials (stock symbol) AMAT Average Memory Access Time AMAT Automatic Message Accounting Transmitter AMAT Anti-Materiel (bomb or mine) AMAT Ageing Management Assessment Team ), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is http://www.appliedmaterials.com. Note: A Photo is available at URL URL in full Uniform Resource Locator Address of a resource on the Internet. The resource can be any type of file stored on a server, such as a Web page, a text file, a graphics file, or an application program. : http://www.businesswire.com/cgi-bin/photo.cgi?pw.120401/bb2 |
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