Applied Materials Launches Advanced Cobalt Solution for Nano-Chip Manufacturing.Business Editors/High-Tech Writers NOTE TO MEDIA: Photo is available in a Smart News Release(TM) on Business Wire's Home Page at www.businesswire.com and at www.newstream.com SANTA CLARA, Calif.--(BUSINESS WIRE)--Dec. 4, 2001 New ALPS (language) ALPS - 1. An early interpreted algebraic language for the Bendix G15 by Richard V. Andree of the University of Oklahoma. ALPS is said to have preceded and influenced development of BASIC. Dale Peters Company's Leadership in PVD PVD - Physical Vapor Deposition (surface coating technology) PVD - Paravisual Director PVD - Paul Van Dyk (musician) PVD - Performance Verification Document PVD - Peripheral Vascular Disease PVD - Peripheral Vision Display PVD - Personal Voice Dialer (Net2phone) PVD - Physical Vulnerability Division PVD - Plain View Display PVD - Plan View Display (Radar Display) PVD - Polyvinyl Dichloride PVD - Portable Vapor Detector Silicide Technology to Sub-130nm Chips Applied Materials, Inc., the leading supplier of PVD (physical vapor deposition) silicide technology to the semiconductor industry, announces its new Endura(R) ALPS Co solution for depositing cobalt silicide films in transistor gate and contact structures of advanced logic and memory devices. The superior bottom coverage achieved by the proprietary, production-worthy ALPS Co process allows chipmakers to extend cost-effective PVD silicide technology well below the 130nm device generation. "Applied Materials' new ALPS Co chamber takes advantage of many new hardware design elements to achieve the kind of breakthrough silicide performance our customers require for their most advanced devices," said Dr. Fusen Chen, vice president and general manager of Applied Materials' Cu, Al Systems and Modules Product Group. "Since the chamber is integrated on the industry-standard Endura mainframe, customers are assured of proven PVD manufacturability and reliability, as well as the capability to upgrade existing chambers chambers n. the private office of a judge, usually close to the courtroom so that the judge can enter the court from back of the bench and not encounter people on the way. Judges hear some motions, discuss formal legal problems like jury instructions, or conduct hearings on sensitive matters such as adoptions "in chambers." (See: in chambers, in camera) for next generation technology. The chamber is already installed at multiple customer sites where it is being used to enable the most advanced logic and memory chips." Cobalt has become the preferred liner film for gate and contact structure applications since it provides low resistivity independent of shrinking linewidths. The new ALPS Co process chamber extends cobalt film technology well beyond 130nm manufacturing by providing the critical bottom coverage necessary for enabling these structures. Optimized target-to-wafer spacing enables greater than 70% bottom coverage on 2.5:1 aspect ratio (AR) transistor gates and greater than 10% coverage in 6:1 AR contacts. The chamber also features a low temperature electrostatic chuck for precise wafer temperature control. Applied Materials' 200mm ALPS Co chamber is based on the company's proven ALPS Aluminum chamber technology and is easily scalable to 300mm manufacturing. The chamber is integrated on Applied Materials' proven Endura platform with an in-situ preclean chamber and a titanium/titanium nitride capping layer chamber for superior film quality and maximum production throughput. Existing PVD silicide chambers currently in use at chipmakers around the world can also be upgraded to ALPS Co technology for next generation manufacturing. Applied Materials (Nasdaq:AMAT), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is http://www.appliedmaterials.com. Note: A Photo is available at URL: http://www.businesswire.com/cgi-bin/photo.cgi?pw.120401/bb2 |
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