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Applied Materials Extends CMP Leadership with 500th 300mm System Shipment.


SANTA CLARA Santa Clara, city, Cuba
Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba.
, Calif. -- Applied Materials, Inc. announced that it has shipped its 500th 300mm CMP CMP (cytidine monophosphate): see cytosine.


(1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information
 (chemical mechanical planarization) system. The semiconductor industry's leading CMP system, the 300mm Applied Reflexion(R) LK CMP, and the revolutionary Applied Reflexion LK Ecmp(TM) (electrochemical electrochemical /elec·tro·chem·i·cal/ (-kem´i-k'l) pertaining to interaction or interconversion of chemical and electrical energies.

e·lec·tro·chem·i·cal
adj.
 mechanical planarization) system, are used by memory and logic chipmakers worldwide for advanced production, as well as for next-generation device development.

"Our 300mm CMP systems provide a winning combination of advanced technology and productivity that spans the entire semiconductor industry, from foundries to IDMs, including the vast majority of CMP systems used for 90nm and below," said Dr. Farhad Moghadam, senior vice president and general manager of Applied Materials' Thin Films Group. "We have now shipped over 2,000 CMP systems, including 200mm Mirra(R) CMP as well as 300mm Reflexion-series CMP systems."

The Applied Reflexion LK CMP system's patented polishing head, endpoint and Desica(R) single-wafer Marangoni wafer clean technologies provide high productivity at ultra-low polishing pressure without watermark watermark: see paper.


See digital watermark.
 defects. The system's unique automated process control (APC (1) (American Power Conversion Corporation, West Kingston, RI, www.apcc.com) The leading manufacturer of UPS systems and surge suppressors, founded in 1981 by Rodger Dowdell, Neil Rasmussen and Emanual Landsman, three electronic power engineers who had worked at MIT. ) technology dramatically reduces wafer variability for enhanced device reliability and yield.

Introduced in 2005, the Applied Reflexion LK Ecmp system eliminates traditional CMP slurries by using an electric charge to remove bulk copper from the wafer at high throughput, cutting chipmakers' operating costs. Its extremely low downforce The term downforce describes the downward pressure created by the aerodynamic characteristics of a car that allows it to travel faster through a corner by holding the car to the track or road surface.  is unsurpassed for polishing sensitive low k dielectric films, while its superior planarization capability helps extend the use of existing dry lithography tools through the 45nm generation by increasing the depth of focus process window. The Applied Ecmp system is the only electrochemical mechanical planarization technology being used in volume production.

Applied Materials, Inc. (Nasdaq:AMAT AMAT Applied Materials (stock symbol)
AMAT Average Memory Access Time
AMAT Automatic Message Accounting Transmitter
AMAT Anti-Materiel (bomb or mine)
AMAT Ageing Management Assessment Team
) is the global leader in nanomanufacturing technology(TM) solutions for the electronics industry with a broad portfolio of innovative equipment, service and software products. At Applied Materials, we apply nanomanufacturing technology to improve the way people live. Learn more at www.appliedmaterials.com.
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Publication:Business Wire
Geographic Code:1USA
Date:Feb 21, 2006
Words:315
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