Applied Materials Enters 300mm Wet Clean Market with Revolutionary New Oasis System.Business Editors/High-Tech Writers NOTE TO MEDIA: Multimedia assets available SANTA CLARA Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif.--(BUSINESS WIRE)--June 19, 2002 Innovative Single-Wafer Oasis(TM) Clean(TM) System Replaces 30-Year-Old Batch Technology with Major Advancements in Cleaning Efficiency, Chemistry and Architecture Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc. brings major advancements in technology and production efficiency to semiconductor wafer cleaning with its new 300mm single-wafer Oasis Clean(TM) system. Replacing traditional batch wet benches, the Oasis Clean offers new technology for the nearly 50 critical cleaning steps needed to fabricate the transistor area of the chip while providing customers with the significantly faster production cycle time and particle removal performance necessary for nanometer chip manufacturing. "The Oasis Clean opens a rapidly growing market to Applied Materials with enabling process technology that can improve the yield and performance of leading-edge semiconductor chips," said Dr. Chris Gronet, vice president and general manager of Applied Materials' Transistor and Capacitor capacitor or condenser, device for the storage of electric charge. Simple capacitors consist of two plates made of an electrically conducting material (e.g., a metal) and separated by a nonconducting material or dielectric (e.g. Product Business Group. "Chipmakers have used essentially the same wet cleaning  This article or section needs copy editing for grammar, style, cohesion, tone and/or spelling.You can assist by [ editing it] now. process and chemistry for over 30 years, since chips had ten micron micron: see micrometer. One micrometer, which is one millionth of a meter or approximately 1/25,000 of an inch. The tiny elements that make up a transistor on a chip are measured in micrometers and nanometers. See process technology. geometries. But as features shrink to the nanometer scale and the number of cleaning steps increases, a faster, more efficient clean process is vital to achieving the high yields and productivity required for 300mm device manufacturing." Providing the cleaning performance needed for higher-yielding wafers, Applied Materials' new Oasis Clean removes virtually 100 percent of the particles from both the front and back sides of a wafer in less than 30 seconds. The system's single-wafer, multi-chamber architecture can cut chipmakers' cycle time by 35 percent or more compared to batch technologies, enabling customers to speed new device generations to market. "We believe that chipmakers will change to single-wafer 300mm cleaning technology not only because of its technical performance, but for its greater production flexibility," said Dr. Kelly Truman, general manager of Applied Materials' Wet Clean Division. "While single-wafer cleaning systems are not new to the industry, this is the first product to meet and exceed the requirements of the entire critical clean market, rather than just niche applications. More important, the Oasis Clean technology has the capability to be integrated with a broad range of complementary technologies, such as etch To create a design in a material by digging out the material. The circuit designs on printed circuit boards and chips are etched by acid. See chip and printed circuit board. and gate dielectric A gate dielectric is a dielectric used between the gate and substrate of a field effect transistor. In state-of-the-art processes, the gate dielectric is subject to many constraints, including: The Oasis Clean system's compact size offers chipmakers the highest throughput in the smallest footprint of any cleaning system available. Each clean module features horizontal spin processing with unique full-coverage megasonics to achieve efficient particle removal for improved customer yields while ensuring low silicon and oxide loss to enable continued device design shrinks. Innovative single-step chemistry allows a complete clean in each chamber and eliminates wafer-to-wafer cross contamination cross contamination Medical practice The passsage of pathogens indirectly from one Pt to another due to use of improper sterilization procedures, unclean instruments, or recycling of products by providing fresh chemicals to every wafer. The system also enables chipmakers to reduce DI water consumption by an order of magnitude A change in quantity or volume as measured by the decimal point. For example, from tens to hundreds is one order of magnitude. Tens to thousands is two orders of magnitude; tens to millions is three orders of magnitude, etc. (10x) over batch systems See batch processing. . Dataquest, a market research firm, estimates the market for 300mm wet clean systems to grow from $420 million in 2002 to more than $1.0 billion in 2004. Applied Materials has already shipped 300mm Oasis Clean systems to customers in several regions of the world. Applied Materials, the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' web site is www.appliedmaterials.com. Applied Materials will present additional information regarding the Oasis Clean system during a live WebCast on www.appliedmaterials.com on Wednesday, June 19, 2002, at 5:45 pm Pacific time. Note: A photo is available at URL URL in full Uniform Resource Locator Address of a resource on the Internet. The resource can be any type of file stored on a server, such as a Web page, a text file, a graphics file, or an application program. : http://www.businesswire.com/cgi-bin/photo.cgi?pw.061902/bb1 |
|
||||||||||||||||||
Printer friendly
Cite/link
Email
Feedback
Reader Opinion