Applied Materials Awarded Patent for Key Chemical Mechanical Polishing Components; Critical Patent Covers Carrier Head and Retaining Ring Components.Business/Technology Editors SANTA CLARA Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif.--(BUSINESS WIRE)--Aug. 24, 2001 The U.S. Patent & Trademark Office granted Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc. Patent No. 6,251,215 covering the carrier head and composite (two piece) AEP AEP - Application Environment Profile (Advanced Edge Performance) retaining ring, which are key components of its industry-leading Mirra(R) CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information (chemical mechanical polishing) system. These components have allowed Applied Materials to enhance the Mirra system's production-worthiness and have enabled the superior process performance of its industry-leading Titan Head(TM) technology. "Applied Materials' significant investment in research, development and engineering is the cornerstone cornerstone Ceremonial building block, dated or otherwise inscribed, usually placed in an outer wall of a building to commemorate its dedication. Often the stone is hollowed out to contain newspapers, photographs, or other documents reflecting current customs, with a view to of our success in helping customers continually improve the performance of our systems," said Dave Fried, corporate vice president and general manager of Applied Materials' Customer Productivity Support Group. "These investments, which have resulted in a significant portfolio of intellectual properties, allow our customers to benefit from the proprietary designs of our critical system technologies and ensure them of receiving the exceptional quality inherent in our products." U.S. Patent No.6,251,215, titled "Carrier head with a Multilayer Retaining Ring for Chemical Mechanical Polishing," was issued on June 26, 2001. Introduced in December, 1995, Applied Materials' Mirra CMP system has achieved widespread customer acceptance, with more than 1,000 systems shipped to customers to date. These systems also include Applied Materials' Mirra Mesa(TM) CMP systems with integrated cleaning and metrology metrology Science of measurement. Measuring a quantity means establishing its ratio to another fixed quantity of the same kind, known as the unit of that kind of quantity. capability and the 300mm Reflexion(TM) CMP system introduced in 2000. Applied Materials (Nasdaq: AMAT AMAT Applied Materials (stock symbol) AMAT Average Memory Access Time AMAT Automatic Message Accounting Transmitter AMAT Anti-Materiel (bomb or mine) AMAT Ageing Management Assessment Team ), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is www.appliedmaterials.com. |
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