Applied Materials' New CMP Enhancement Package Establishes the Performance and Productivity Standard for Oxide Applications.Business Editors/High-Tech Writers NOTE TO MEDIA: Photo/Logo are available in a Smart News Release(TM) on Business Wire's Home Page at www.businesswire.com and at www.newstream.com SANTA CLARA Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif.--(BUSINESS WIRE)--July 16, 2001 Oxide HP Package Enables Higher Yield, Lower Cost of Ownership Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar , Inc. (Nasdaq:AMAT AMAT Applied Materials (stock symbol) AMAT Average Memory Access Time AMAT Automatic Message Accounting Transmitter AMAT Anti-Materiel (bomb or mine) AMAT Ageing Management Assessment Team ) today announced the new Oxide HP enhancement package for its industry-leading Mirra Mesa(TM) CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information (chemical mechanical planarization) system. Setting a new performance and productivity standard for ILD (Inter Layer Dielectric) The insulation used between layers of aluminum or copper wire that interconnect the transistors in a chip. There are three to four layers in a memory chip and five to seven in a logic chip with hundreds of meters of wiring. (inter-layer dielectric) and PMD (Polarization Mode Dispersion) The type of dispersion that occurs in singlemode fiber due to a lack of perfect symmetry in the fiber and from external pressures on the cable. Light travels over singlemode fiber in two polarization states. (pre-metal dielectric) oxide CMP applications, the Oxide HP package delivers 2x tighter topography control and 30 percent lower cost of ownership over the baseline performance of previous offerings, enabling higher productivity and extendibility to the sub-100 nanometer device node. "The biggest challenge to improving oxide CMP, which is the most widely used CMP application, is to provide market-leading process performance with higher productivity at lower cost of ownership," said Chris Smith Chris Smith is the name of: In politics:
Key features of the new Oxide HP package are the Titan Profiler(TM) polishing head, in-line metrology with closed loop control and a high-productivity process. Titan Profiler can adjust its polishing profile at all areas on the wafer, so that uniformity across the wafer to 3mm edge exclusion is optimized. This enables increased edge die yield per wafer. The in-line metrology with closed loop control ensures more accurate and repeatable wafer-to-wafer oxide film thickness control. It also eliminates off-line metrology requirements, which increases productive tool time. Longer life consumables deliver a 14 percent reduction in cost of ownership. With a process tailored for the production-proven 3-platen Mirra Mesa architecture, throughput is greater than 50 wafers per hour. The combined market for ILD and PMD oxide CMP technology CMP Technology (formerly CMP Media) is a business-to-business multimedia company that provides information and integrated marketing services to technology professionals worldwide. is expected grow from $505 million in 2001 to $800 million by 2006, according to Dataquest. The total market for CMP, estimated to be $1.2 billion in 2001, is forecast to reach $2.6 billion by 2006. Applied Materials (Nasdaq:AMAT), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is http://www.appliedmaterials.com. Note: A Photo is available at URL URL in full Uniform Resource Locator Address of a resource on the Internet. The resource can be any type of file stored on a server, such as a Web page, a text file, a graphics file, or an application program. : http://www.businesswire.com/cgi-bin/photo.cgi?pw.071601/bb4 |
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