Aixtron AG: AIXTRON Receives First Order for Merged ALD and AVD(TM) Technologies.AACHEN, Germany -- AIXTRON AG (FSE FSE 1. feline spongiform encephalopathy. 2. focal symmetrical encephalomalacia. : AIX (Advanced Interactive eXecutive) IBM's Unix-based operating system which runs on its Intellistation workstations and pSeries, p5, iSeries and i5 server families. , ISIN Isin (ĭs`ĭn), capital of an ancient Semitic kingdom of N Babylonia. The city became important after the third dynasty of Ur fell to the Elamites and the Amorites (c.2025 B.C.). The phase from c.2025–c.1763 B.C. DE0005066203; NASDAQ NASDAQ in full National Association of Securities Dealers Automated Quotations U.S. market for over-the-counter securities. Established in 1971 by the National Association of Securities Dealers (NASD), NASDAQ is an automated quotation system that reports on : AIXG), a leading manufacturer of deposition equipment to the global semiconductor industry, today announced that it has received the first system order from a leading Asian memory manufacturer for a combined Genus 300 mm Atomic Layer Deposition A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century. (ALD ALD abbr. adrenoleukodystrophy ALD, n.pr See adrenoleukodystrophy. ALD aldolase. ) StrataGem STRATAGEM. A deception either by words or actions, in times of war, in order to obtain an advantage over an enemy. 2. Such stratagems, though contrary to morality, have been justified, unless they have been accompanied by perfidy, injurious to the rights of and Atomic Vapor Deposition Vapor deposition Production of a film of material often on a heated surface and in a vacuum. Vapor deposition technology is used in a large variety of applications. (AVD AvD Automobilclub von Deutschland (German automobile club) AVD Academy of Veterinary Dentistry AVD Audio Video Design (Melbourne, FL) AVD Audio Video Data AVD Association des Volontaires pour le Développement (TM)) technologies. This order represents a progressive step into next-generation solutions for High-k Dielectrics in DRAM Capacitor sub 45nm high volume production. DRAM technology continues to be a major driver of innovations in process technology and manufacturing equipment for Genus products. Installation will start during third quarter 2006; revenues will be booked in the second half of 2006. One year after the completion of the AIXTRON - Genus merger, the new entity reaps further significant benefits from its strength in product development. ALD and AVD(TM) technologies have already demonstrated that they can overcome many of the limitations of current film deposition techniques. The process modules combining ALD and AVD(TM) technologies will be installed at the customer's purpose-built 300 mm R&D fab, are a driving force into mainstream/HV semiconductor processing. The joint development program represents an important step forward in strengthening AIXTRON's position for providing enabling deposition solutions for these emerging semiconductor applications. The initial work will focus on: --Evaluation of various high-k dielectrics and metal gate materials for large-scale production purposes --Integration of those materials into high-k gate stacks & advanced DRAM capacitors --Optimization of DRAM and CMOS (Complementary Metal Oxide Semiconductor) Pronounced "c-moss." The most widely used integrated circuit design. It is found in almost every electronic product from handheld devices to mainframes. device structures for Sub-45nm. Dr. William W. R. Elder, the Member of AIXTRON's Executive Board responsible for all of AIXTRON's silicon business interests comments: "Many of Genus" primary customers are major chip manufacturers in the memory (DRAM and FLASH) segment of the semiconductor industry. The process modules are based on a patented process chamber concept and have achieved a leading position for the deposition of tungsten silicide sil·i·cide n. A compound of silicon with another element or radical. Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical (WSix) and high-k materials, primarily used in memory and capacitor applications. With ALD, AVD(TM) technologies and the company's core tungsten silicide CVD CVD Cardiovascular disease, see there platform, we are now able to offer our customers a full and comprehensive portfolio of semiconductor process technologies." For further information on AIXTRON AG (FSE: AIX, ISIN DE0005066203; NASDAQ: AIXG) please consult our website at: www.aixtron.com. Forward-Looking Statements This news release may contain forward-looking statements about the business, financial condition, results of operations and earnings outlook of AIXTRON within the meaning of the "safe harbor Safe Harbor 1. A legal provision to reduce or eliminate liability as long as good faith is demonstrated. 2. A form of shark repellent implemented by a target company acquiring a business that is so poorly regulated that the target itself is less attractive. " provisions of the United States Private Securities Litigation Reform Act The Private Securities Litigation Reform Act of 1995 (PSLRA) implemented several significant substantive changes affecting certain cases brought under the federal securities laws, including changes related to pleading, discovery, liability, class representation and awards fees and of 1995. Words such as "may", "will", "expect", "anticipate", "contemplate", "intend", "plan", "believe", "continue" and "estimate", and variations of these words and similar expressions, identify these forward-looking statements. The forward-looking statements reflect our current views and assumptions and are subject to risks and uncertainties. You should not place undue reliance on the forward-looking statements. The following factors, and others which are discussed in AIXTRON's public filings and submissions with the U.S. Securities and Exchange Commission, are among those that may cause actual and future results and trends to differ materially from our forward-looking statements: actual customer orders received by AIXTRON; the extent to which chemical vapor deposition, or CVD, technology is demanded by the market place; the timing of final acceptance of products by customers; the financial climate and accessibility of financing; general conditions in the thin film equipment market and in the macro-economy; cancellations, rescheduling or delays in product shipments; manufacturing capacity constraints; lengthy sales and qualification cycles; difficulties in the production process; changes in semiconductor industry growth; increased competition; exchange rate fluctuations; availability of government funding; variability and availability of interest rates; delays in developing and commercializing new products; general economic conditions being less favorable than expected; and other factors. The forward-looking statements contained in this news release are made as of the date hereof and AIXTRON does not assume any obligation to update or revise any forward-looking statements, whether as a result of new information, future events or otherwise, unless required by law.
Contact:
Investor Relations and Corporate Communications
AIXTRON AG, Kackertstr. 15-17, 52072 Aachen, Germany
Phone: +49 241 8909 444, Fax: +49 241 8909 445, invest@aixtron.com
www.aixtron.com
Language: English
Issuer: AIXTRON AG
Kackertstr. 15-17
52072 Aachen Deutschland
Phone: +49 (0)241 8909-444
Fax: +49 (0)241 8909-445
E-mail: invest@aixtron.com
WWW: www.aixtron.com
ISIN: DE0005066203
WKN: 506620
Indices: TecDAX
Listed: Geregelter Markt in Frankfurt (Prime Standard);
Freiverkehr in Berlin-Bremen, Stuttgart, Munchen,
Hamburg, Dusseldorf; Foreign Exchange(s) Nasdaq
|
|
||||||||||||||||
Printer friendly
Cite/link
Email
Feedback
Reader Opinion