Advantest Launches Lithography System Supporting 300mm, 65nm and Below Process Technology.
Tokyo, Japan, Oct 26, 2006 - (JCN) - Advantest Corporation announced availability on October 24 of the F3000 F3000 - Formula 3000 (motor racing) electron beam A stream of electrons, or electricity, that is directed towards a receiving object. See electron beam imaging and electron beam lithography. (EB) lithography system, which supports 300 mm wafer process technology and 65 nm rule devices - and smaller.
The F3000 uses a maskless lithography system employs electron beam direct writing (EBDW) technologies to draw 65 nm circuits, and smaller, on 300 mm wafers.
According to the company, the F3000 achieves an approximately 20% improvement over Advantest's previous model in image placement accuracy and critical dimension control - two of the main challenges resulting from pattern miniaturization.
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