ASML Enters Global Market for Thin-Film Head Lithography Systems.VELDHOVEN, The Netherlands--(BUSINESS WIRE)--Sept. 21, 1999-- ASML's Special Applications Unit Introduces New i-Line and Deep UV Steppers for TFH TFH Technische Fachhochschule (German: Engeneering College/University) TFH 24 Hours (Movie) TFH Thread from Hell (newsgroups) TFH Tinfoil Hat TFH Thanks For Helping Processing Making its entry into the growing market for thin-film head (TFH) production equipment, ASML's Special Applications division (ASML ASML Abstract State Machine Language ASML Anisotropic Shielded Microstrip Line SA) has introduced a new family of lithography systems designed for patterning advanced TFHs used in disk drives. The SA 5500/TFH100 i-line stepper step·per n. 1. One that steps, especially in a fast or spirited manner. 2. Informal A dancer. Noun 1. and SA 5500/TFH300 deep UV system are designed to leverage ASML's 15 years of experience in semiconductor fabrication fabrication (fab´rikā´sh n the construction or making of a restoration. toward creating production-proven lithography systems for the global data storage industry. Global market demand for TFHs is projected to grow nearly 75 percent from 913 million units in 1998 to more than 1,596 million units by 2001, according to according to prep. 1. As stated or indicated by; on the authority of: according to historians. 2. In keeping with: according to instructions. 3. the data storage market research firm Peripheral Research Inc. To mass produce current and future generations of TFHs, manufacturers require lithography systems, which are capable of printing device features measuring less than half of a micron wide. ASML's new TFH stepper family has the resolution capability necessary to push TFH areal densities over 10 gigabytes per square inch. The imaging, overlay performance and process flexibility of both the SA 5500/TFH100 and the SA 5500/TFH300 enable customers to easily migrate to the next generation of devices. These new systems provide industry-leading colinearity and lens distortion Image displacement caused by lens irregularities and aberrations. performance, allowing imaging fields to be reliably and repeatably "stitched" together side by side to produce the elongated e·lon·gate tr. & intr.v. e·lon·gat·ed, e·lon·gat·ing, e·lon·gates To make or grow longer. adj. or elongated 1. Made longer; extended. 2. Having more length than width; slender. rowbars for TFHs used in today's advanced disk drives. Designed for versatile substrate handling, the ASML machines are capable of processing square TFH substrates up to 4.5 inches and round TFH substrates up to 8 inches in diameter and up to 2 mm thick. The SA 5500/TFH300 deep UV stepper is capable of 0.25-micron resolution, which can be used for the most critical layers in TFH production. The SA 5500/TFH100 uses i-line lithography to achieve resolution down to 0.4 micron, suitable for patterning less critical TFH features. While both systems may be used independently, these two tools also offer the compatibility to be used together in a manufacturing strategy called mix-and-match, in which the deep UV system exposes the most critical device features and the i-line tool is used for patterning larger geometries. This mix-and-match capability enables TFH manufacturers to leverage their lithography investments and achieve the greatest cost efficiencies in production. The SA 5500/TFH100 has a specified throughput of more than 100 six-inch-round substrates per hour with a pattern overlay accuracy of less than or equal to 60 nm. For the SA 5500/TFH300, these values are more than 120 substrates per hour and less than or equal to 45 nm. "Despite the demands of thin-film head lithography, manufacturers have typically had to adapt lithography tools designed for other applications," said Eduard Hoeberichts, vice president and managing director for ASML SA. "ASML has taken its proven lithography experience and used it to design systems to meet the specific needs of thin-film head processing, including superior cost-effectiveness and the flexibility to accommodate different substrate shapes." About ASML: ASM (1) (Association for Systems Management) An international membership organization based in Cleveland, Ohio. Founded in 1947 and disbanded in 1996, it sponsored conferences in all phases of administrative systems and management. Lithography was founded in 1984 and is a world leader in advanced photolithography systems that are essential to the fabrication of modern integrated circuits Integrated circuits Miniature electronic circuits produced within and upon a single semiconductor crystal, usually silicon. Integrated circuits range in complexity from simple logic circuits and amplifiers, about 1/20 in. (1. . The company now has an installed base of more than 1,200 systems at customer sites around the world. Recognized as one of the two largest suppliers of wafer steppers and Step & Scan systems, ASML operates demonstration and application laboratories at its corporate headquarters located in Veldhoven, The Netherlands, and at its U.S. headquarters in Tempe, Arizona. Regional sales and service facilities are located worldwide near its customers' premises. ASML is publicly traded on both the Amsterdam Exchanges and on the Nasdaq Stock Market Nasdaq stock market The first electronic stock market listing over 5000 companies. The Nasdaq stock market comprises two separate markets, namely the Nasdaq National Market, which trades large, active securities and the Nasdaq Smallcap Market that trades emerging growth companies. (R) under the symbol "ASML." Visit the company's web site at http://www.asml.com for more information on ASML. -0- "Safe Harbor Safe Harbor 1. A legal provision to reduce or eliminate liability as long as good faith is demonstrated. 2. A form of shark repellent implemented by a target company acquiring a business that is so poorly regulated that the target itself is less attractive. " Statement under the Private Securities Litigation Reform Act The Private Securities Litigation Reform Act of 1995 (PSLRA) implemented several significant substantive changes affecting certain cases brought under the federal securities laws, including changes related to pleading, discovery, liability, class representation and awards fees and of 1995: Except for historical information, the matters discussed in this news release that may be considered forward-looking statements may be subject to certain risks and uncertainties that could cause the actual results to differ materially from those projected, including uncertainties in the market, pricing competition, procurement and manufacturing efficiencies, and other risks detailed from time to time in reports filed by the Company with the Securities and Exchange Commission. The Company assumes no obligation to update the information in this release. |
|
||||||||||||

Printer friendly
Cite/link
Email
Feedback
Reader Opinion