ASML Debuts Enhanced Alignment System for Advanced Applications Such As W-CMP Layers and Shallow Trench Isolation.SANTA CLARA, Calif.--(BUSINESS WIRE)--March 15, 1999-- ATHENA(TM) Improves Process Latitude and Productivity, Enabling Better Overlay Performance and Throughput of Next-Generation Lithography Processes; Press release issued by ASM (1) (Association for Systems Management) An international membership organization based in Cleveland, Ohio. Founded in 1947 and disbanded in 1996, it sponsored conferences in all phases of administrative systems and management. Lithography Holding N.V. (Ticker symbol Ticker Symbol An arrangement of characters (usually letters) representing a particular security listed on an exchange or otherwise traded publicly. When a company issues securities to the public marketplace, it selects an available ticker symbol for its securities which investors "ASML ASML Abstract State Machine Language ASML Anisotropic Shielded Microstrip Line " on both Amsterdam Exchanges and Nasdaq National Market System) Breaking new ground in semiconductor pattern-alignment technology, ASM Lithography (ASML) introduced its new Advanced Technology using High-order ENhanced Alignment system, or ATHENA, at the SPIE SPIE International Society for Optical Engineering SPIE Society of Photo-Optical Instrumentation Engineers SPIE Source Path Isolation Engine SPIE Special Purpose Insertion Extraction SPIE Software Process Improvement Experimentation SPIE Standard Protocols in Effect Microlithography Conference here this week. The enhanced off-axis alignment system is designed to provide a larger overlay process window for printing more complex film stacks, including difficult chemical mechanical polishing (CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information ) layers such as tungsten and shallow trench isolation Shallow trench isolation (STI) is an integrated circuit feature which prevents electrical current leakage between adjacent semiconductor device components. STI is generally used on CMOS process technology nodes of 250 nanometers and smaller. (STI STI systolic time intervals. ) features. CMP processes often cause a physical change in alignment marks by asymmetrically rounding edges of the alignment marks, and STI processing can result in the use of very shallow alignment marks. ATHENA is designed to accurately determine the position of the marks' edges by using both red and green illumination lasers and by individually detecting seven diffracted orders of light from each wavelength. The large amount of data collected from the seven diffracted orders provides a more accurate determination of the mark's position even when subjected to CMP polishing. The red and green wavelengths enhance the alignment system's tolerance to variations in process film thickness, which might result in low alignment signal due to thin-film interference effects. By using two wavelengths, a strong signal strength is always present in the ATHENA alignment system. In addition to achieving a larger process window for overlay, ATHENA incorporates high-speed scanning, faster electronics and improved software algorithms that boost throughput speeds by eight percent for ASML's most advanced Step & Scan lithography equipment. The complete ATHENA package includes graphical user interface graphical user interface (GUI) Computer display format that allows the user to select commands, call up files, start programs, and do other routine tasks by using a mouse to point to pictorial symbols (icons) or lists of menu choices on the screen as opposed to having to (GUI (Graphical User Interface) A graphics-based user interface that incorporates movable windows, icons and a mouse. The ability to resize application windows and change style and size of fonts are the significant advantages of a GUI vs. a character-based interface. ) driven software and diagnostics to assist in selecting the optimal alignment recipe for any application. ATHENA is designed to be easily retrofitted or factory-installed into ASML's equipment for R&D, process development and volume production tasks. ATHENA is now standard on PAS 5500/400B, PAS 5500/550B and PAS 5500/700B Step & Scan systems, and is available as an option on PAS 5500/500 and PAS 5500/900 Step & Scan tools as well as ASML's i-line and deep UV stepper step·per n. 1. One that steps, especially in a fast or spirited manner. 2. Informal A dancer. Noun 1. models. Multiple orders for this system upgrade have already been received. "As the semiconductor industry quickly transitions to 180 nm device geometries and below, there is an immediate need for improved overlay accuracy on difficult process layers," said Dr. James Greeneich, ASML's vice president of strategic marketing. "ATHENA allows us to continue to improve our systems' performance and to address our customer's needs for next-generation lithography solutions." About the Company ASM Lithography was founded in 1984 and is a world leader in advanced photolithography systems that are essential to the fabrication fabrication (fab´rikā´sh  n),n the construction or making of a restoration. of modern integrated circuits. The company now has an installed base of more than 1,200 systems at customer sites around the world. Recognized by Dataquest as the second largest supplier of wafer steppers and Step & Scan systems in the world, ASML operates demonstration and application laboratories at its corporate headquarters located in Veldhoven, The Netherlands, and at its U.S. headquarters in Tempe, Arizona. Regional sales and service facilities are located worldwide near its customers' premises. Since March 1995, ASM Lithography has been publicly traded on both the Amsterdam Exchanges and the Nasdaq National Market System. Please visit the company's web site at http://www.asml.com for more information on ASM Lithography. |
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