ASML Announces PAS 5500/700B High NA, Deep UV Step & Scan System For 150 nm Production At 104 WPH.VELDHOVEN, Netherlands--(BUSINESS WIRE)--Oct. 20 1998-- Starlith 700(tm) Lens and ATHENA(tm) Alignment System Enable Latest-Generation Lithography Tool to Achieve Highest Resolution, Alignment and Productivity A new member of ASML's (ASM (1) (Association for Systems Management) An international membership organization based in Cleveland, Ohio. Founded in 1947 and disbanded in 1996, it sponsored conferences in all phases of administrative systems and management. Lithography) PAS 5500 high-productivity, deep UV Step & Scan lithography systems -- combining the industry's fastest scanning stages with the highest numerical aperture (NA) lens -- debuts on the world market today. The PAS 5500/700B is targeted for 150 nm (0.15 micron) design rule applications with production throughputs of 104 200 mm wafers per hour. "While incorporating our proven Step & Scan stages with industry-leading stepping speed of 500 mm/second and scanning speed of 250 mm/second, the new PAS 5500/700B incorporates several new features that make it the world's first production-worthy machine for 150 nm processing," said Evert e·vert v. To turn inside out or outward. evert to turn inside out; to turn outward. Polak, ASML's vice president of marketing. The PAS 5500/700B is equipped with the new Starlith 700 lens from ASML's optics partner Carl Zeiss. Combined with ASML's field-proven scanning stage capabilities, this lens with its NA of 0.7 -- the industry's highest -- enables the system's high resolution. Another improvement is the AERIAL II(tm) high-transmission illuminator illuminator (light box), n a source of light with uniform intensity for viewing radiographs. illuminator the source of light for viewing an object. , developed by ASML ASML Abstract State Machine Language ASML Anisotropic Shielded Microstrip Line and Carl Zeiss. AERIAL II provides much higher transmission of 248 nm wavelength light. This plays an essential role in achieving the system's high throughput of 104 200 mm wafers per hour. Overlay accuracy using ASML's through-the-lens (TTL (1) (Time To Live) A parameter in a network packet that sets a time limit to its validity. In order to prevent an IP packet from propagating endlessly through the network, the value in the TTL field is reduced by each router. ) phase grating alignment (PGA (1) (Professional Graphics Adapter) An early IBM PC display standard for 3D processing with 640x480x256 resolution. It was not widely used. (2) (Programmable Gate Array) See gate array and FPGA. ) system is specified at less than 40 nm for single machine and less than 60 nm for matched machine applications. The PAS 5500/700B is also equipped with ASML's new ATHENA alignment scheme. ATHENA's operating principles are identical to those of the proven TTL PGA scheme. Alignment performance is enhanced because ATHENA uses two different illumination wavelengths and collects information from seven diffracted orders separately at each wavelength. This provides a larger process window for more complex multilayer film stacks, including new advanced CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information and copper metalization processes. "Because we are providing our customers with such a significant productivity advantage in their extremely competitive markets, we expect a strong demand for the PAS 5500/700B when shipments begin in April 1999," Polak said. "We believe demand will be significant as innovations in semiconductor device technology continue to drive the need for ever-higher performance from lithography tools. With the introduction of this system, the 150 nm era of volume IC production has arrived." Pricing of the PAS 5500/700B is set at NLG NLG The ISO 4217 currency code for the Dutch Guilder. 16.5 million (U.S. $8.2 million). Multiple orders have already been received. ASM Lithography (Nasdaq: ASMLF, Amsterdam Stock Exchange
The Amsterdam Stock Exchange is the former name for the stock exchange based in Amsterdam. : ASML) is a world leader in photolithography with an installed base of more than 1,000 systems at customer sites around the world. The company, which had 1997 revenues of NLG 1,803 million (U.S. $889 million), is recognized by Dataquest as the No. 2 supplier of steppers in the world and was the highest ranked lithography company in VLSI VLSI: see integrated circuit. (1) (Very Large Scale Integration) Between 100,000 and one million transistors on a chip. See SSI, MSI, LSI and ULSI. (2) (VLSI Technology, Inc., Tempe, AZ, www.semiconductors. Research Inc.'s annual customer satisfaction survey for 1998. ASML is headquartered in Veldhoven, The Netherlands, with a U.S. operations center in Tempe, Ariz., and regional sales and service facilities in Korea, Taiwan, Japan and Singapore. "Safe Harbor" Statement under the Private Securities Litigation Reform Act The Private Securities Litigation Reform Act of 1995 (PSLRA) implemented several significant substantive changes affecting certain cases brought under the federal securities laws, including changes related to pleading, discovery, liability, class representation and awards fees and of 1995: the matters discussed in this news release include forward-looking statements that are subject to risks and uncertainties including, but not limited to, economic conditions, product demand and industry capacity, competitive products and pricing, manufacturing efficiencies, new product development, ability to enforce patents, availability of raw materials and critical manufacturing equipment, trade environment, and other risks indicated in filings with the U.S. Securities and Exchange Commission. Note to Editors: For a set of the presentation materials on ASML's new product, call either the corporate communications or the marketing communications contact person above. |
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