ASML Announces Completion of an Agreement to Acquire OPC Leader MaskTools.VELDHOVEN, The Netherlands--(BUSINESS WIRE)--June 1, 1999-- Acquisition Gives ASML ASML Abstract State Machine Language ASML Anisotropic Shielded Microstrip Line Leading-Edge Optical Proximity Correction Technology and Establishes a New Company in Silicon Valley ASM (1) (Association for Systems Management) An international membership organization based in Cleveland, Ohio. Founded in 1947 and disbanded in 1996, it sponsored conferences in all phases of administrative systems and management. Lithography (Nasdaq:ASML)(Amsterdam Exchange Amsterdam Exchange (AEX) Exchange that comprises the AEX-Effectenbeurs, the AEX-Optiebeurs (formerly the European Options Exchange or EOE) and the AEX-Agrarische Termijnmarkt. :ASML), a leading global supplier of photolithography systems used in manufacturing advanced semiconductor devices, has completed an agreement to acquire privately held MaskTools, a business unit of MicroUnity Systems Engineering, Inc. of Sunnyvale, Calif. The acquisition will create a new company ASML MaskTools, Inc., which will be a wholly owned subsidiary Wholly Owned Subsidiary A subsidiary whose parent company owns 100% of its common stock. Notes: In other words, the parent company owns the company outright and there are no minority owners. of ASML and established at a new site in Silicon Valley. MaskTools, a pioneer in wavefront Noun 1. wavefront - (physics) an imaginary surface joining all points in space that are reached at the same instant by a wave propagating through a medium wave front engineering, has incorporated its patented optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. (OPC (1) (OpenGL Performance Characterization) A project group within GPC that manages OpenGL benchmarks. OPC endorses the Viewperf and GLperf benchmarks. Viewperf was created by IBM and OPC provides viewsets for it, which are combinations of tests using specific ) solution in its MaskRigger(R) product. OPC technology enhances leading-edge photolithography systems, such as those manufactured by ASML, to accurately and reliably print linewidths below 0.2 micron required in fabricating next-generation semiconductor devices. "New lithographic lith·o·graph n. A print produced by lithography. tr.v. lith·o·graphed, lith·o·graph·ing, lith·o·graphs To produce by lithography. systems are being delivered with resolution specifications below the wavelength of light, and MaskTools' technology is a key enabler in making these tools perform in production environments," said Doug Marsh, ASML's vice president of U.S. technology development and the president of the newly formed company. "As a provider of leading-edge imaging solutions, ASML is continuously evaluating unique new technologies which bring a distinct competitive advantage to our customers. "Aggressive shrink of resolution versus wavelength is providing opportunities for low k imaging. Therefore, we believe that an integration of advanced mask technologies, like MaskTools' OPC capabilities, with our systems may provide unique imaging advantages to our customers," added Martin van den Brink, executive vice president of marketing and technology for ASML. MaskTools, currently a business unit within MicroUnity Systems Engineering, Inc., employs 10 people and is headed by Roger Caldwell, who will join ASML MaskTools, Inc. as vice president of operations. "Our strong portfolio of innovative reticle ret·i·cle n. A grid or pattern placed in the eyepiece of an optical instrument, used to establish scale or position. [Latin r design and mask qualification products presents excellent synergy with ASML's imaging capabilities roadmap and will contribute directly to ASML's future success in providing next-generation lithography tools," said Caldwell. The acquisition of MaskTools is scheduled to be completed in the second quarter of 1999, and is not expected to significantly impact ASML's earnings per share. About MicroUnity MicroUnity Systems Engineering, Inc. is a privately held technology company based in Sunnyvale, Calif. For more information on MicroUnity's broadband mediaprocessor products and services, contact the company at telephone: 408/734-8100; fax: 408/734-8136; Internet: www.microunity.com. About ASML ASM Lithography was founded in 1984 and is a world leader in advanced photolithography systems that are essential to the fabrication of modern integrated circuits. The company now has an installed base of more than 1,200 systems at customer sites around the world. Recognized as the world's second largest supplier of wafer steppers and Step & Scan systems, ASML operates demonstration and application laboratories at its corporate headquarters located in Veldhoven, The Netherlands, and at its U.S. headquarters in Tempe, Arizona. Regional sales and service facilities are located worldwide near its customers' premises. ASML is publicly traded on both the Amsterdam Exchanges and on the Nasdaq Stock Market Nasdaq stock market The first electronic stock market listing over 5000 companies. The Nasdaq stock market comprises two separate markets, namely the Nasdaq National Market, which trades large, active securities and the Nasdaq Smallcap Market that trades emerging growth companies. (R) under the symbol "ASML." Please visit the company's web site at http://www.asml.com for more information on ASML. "Safe Harbor" Statement under the Private Securities Litigation Reform Act The Private Securities Litigation Reform Act of 1995 (PSLRA) implemented several significant substantive changes affecting certain cases brought under the federal securities laws, including changes related to pleading, discovery, liability, class representation and awards fees and of 1995: Except for historical information, the matters discussed in this news release that may be considered forward-looking statements may be subject to certain risks and uncertainties that could cause the actual results to differ materially from those projected, including uncertainties in the market, pricing competition, procurement and manufacturing efficiencies, and other risks detailed from time to time in reports filed by the Company with the Securities and Exchange Commission. The Company assumes no obligation to update the information in this release. |
|
||||||||||||||
Printer friendly
Cite/link
Email
Feedback
Reader Opinion