APPLIED MATERIALS' QUANTUM LEAP SYSTEM IN DEMAND AS THE INDUSTRY MOVES TO NEW CHIP DESIGNS.According to according to prep. 1. As stated or indicated by; on the authority of: according to historians. 2. In keeping with: according to instructions. 3. market research firm Dataquest, the market for high current ion implant implant /im·plant/ (im-plant“) to insert or to graft (tissue, or inert or radioactive material) into intact tissues or a body cavity. systems is projected to be $249 million in 1999 and is expected to grow to $536 million by 2004, for a compound annual growth rate (1998-2004) of 16.5 percent. Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar Inc., a leading suppler of high current ion implanters, has shipped multiple Quantum LEAP quantum leap n. An abrupt change or step, especially in method, information, or knowledge: "War was going to take a quantum leap; it would never be the same" Garry Wills. (Low Energy Advanced Processing) ion implantation Ion implantation A process that utilizes accelerated ions to penetrate a solid surface. The implanted ions can be used to modify the surface composition, structure, or property of the solid material. systems to customers in the US, Europe, Taiwan and Singapore since its introduction in July 1999. One of the first Quantum systems quantum system n. A physical or theoretical system that cannot be correctly described without the use of quantum physics. was shipped to Lucent Technologies' Cirent Semiconductor facility in Oralndo, Fla., for the formation of advanced transistor structures in its next-generation communications semicondcutors. The new Quantum ion implantation system uses a new, small footprint platform that bridges 200mm and 300mm wafer sizes. High throughput and productivity are possible at low energies down to 200eV -- a requirement for the critical implants used in 0.18 micron and below devices. The Quantum system's extremely short beam path minimizes beam "blow up" and enrgy contamination, with new technology that ensures energy accuracy and control for ultra-low energy implants to +/- 0.5 percent. Quantum implanters are currently available in three models: the Quantum LEAP technology, which offers an ultra-low energy range of 200eV to 80keV; the Quantum 80, which covers a range of 2keV to 80keV; and the Quantum 120, which performs at an extended upper energy range fo 120keV. |
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