AMD Successfully Utilizes Canary ESD Service from DuPont Photomasks and Ion to Protect Photomasks in Fab 25.

Business Editors/High-Tech Writers

ROUND ROCK, Texas and BERKELEY, Calif.--(BUSINESS WIRE)--April 24, 2001

New Service Facilitates Improved Wafer Yields by Preventing

ESD Damage to Photomasks

DuPont Photomasks, Inc. (Nasdaq:DPMI) and Ion Systems today announced that Advanced Micro Devices (NYSE:AMD) successfully utilized the new Canary(TM) ESD Service developed by the two companies to qualify and mitigate electrostatic discharge (ESD) events on photomasks at its Fab 25 facility in Austin.

Using patent-pending photomask technology and processes created by DuPont Photomasks and Ion, the advanced ESD audit service is aimed at improving wafer yields by identifying and eliminating the sources of ESD in the photomask path. The Canary ESD Service became available in September 2000.

Photomasks are critical components in the semiconductor manufacturing process, and are used to pattern integrated circuits (ICs) on silicon wafers. Electrostatic discharge can cause degradation to the circuit patterns on photomasks, leading to device failure.

Product and yield loss resulting from ESD damage to photomasks costs the semiconductor industry millions of dollars annually. As semiconductor design rules continue to shrink, photomasks are becoming increasingly vulnerable to the harmful effects of ESD events. With smaller design geometry, damage can occur even without physical contact and at low levels of electrostatic exposure, causing greater wafer yield loss, process downtime and photomask replacement costs.

In October 2000, AMD signed on for the new service at its Fab 25 facility with the goal of reducing photomask loss due to ESD events to zero.

"By utilizing the Canary ESD Service, we are protecting our photomasks from the potentially devastating effects of ESD events. This should enable us to protect wafer yields and improve productivity, by reducing process downtime and replacement and repair costs associated with ESD-damaged photomasks," said Dan Sutton, senior member technical staff, AMD.

AMD is implementing several recommendations from the Canary ESD Service audit team as ways to reduce the likelihood of ESD events. These include modifying photomask-handling procedures and evaluating new materials that can help manage and dissipate static charge, the root cause of electrostatic energy. Additionally, the chipmaker is using the Canary ESD Service to identify ESD risk factors in new equipment.

"We are certainly receiving the benefits of the collaborative efforts of two industry leaders. DuPont Photomasks and Ion have developed a very thorough and scientific approach to stemming the effects of ESD, and we hope to reduce ESD events on photomasks to zero," commented Sutton. "Safeguarding our photomasks at Fab 25 has given us such peace of mind that we're planning to utilize the Canary ESD Service at our other fabs."

"A growing number of our customers believe that a factor in yield loss on wafers is due to the damaging effects that ESD events have on photomask patterns, especially as advanced photomask technologies are increasingly used," said Ken Rygler, executive vice president, Worldwide Marketing and Strategic Planning, DuPont Photomasks. "The combined expertise of DuPont Photomasks and Ion in photolithography and electrostatic energy management, respectively, makes for a powerful solution to ESD problems. We are pleased that AMD is discovering firsthand the potential that this service has in improving wafer yields."

"Electrostatic discharge is a costly industry issue that affects every member of the photolithography value chain. Our development of the Canary ESD Service with DuPont Photomasks and AMD's subsequent utilization are reflective of the kind of industry cooperation required to meet the growing complexity of the subwavelength era," said Scott Gehlke, president and chief executive officer, Ion.

Representatives of DuPont Photomasks and Ion will be available during SEMICON Europa, April 24-26, to discuss the Canary ESD Service.

About Canary ESD Service

The Canary ESD Service combines proprietary photomask technology with exclusive ESD audit capabilities to determine the cause of ESD damage to photomasks and present solutions for controlling static energy. Canary technicians can analyze the entire photolithography process or any part of it, including photomask receiving, transport pods, stocker, exposure tools and inspection stations.

About DuPont Photomasks, Inc.

DuPont Photomasks leads the photomask industry with one of the most technically advanced manufacturing networks. The company supplies photomasks to the global semiconductor industry from 13 strategically located facilities in North America, Europe and Asia, and derives 33 percent of its current revenues from leading-edge photomasks with 0.18-micron or smaller design rules. DuPont Photomasks also produces and supplies photoblanks (photomask substrates) and pellicles (protective covers for photomasks). Headquartered in Round Rock, Texas, DuPont Photomasks posted worldwide sales of approximately $328 million in fiscal 2000. The company maintains a Web site at http://www.photomask.com.

About Ion Systems

Ion, an ISO 9001 certified company, provides electrostatic energy management solutions to help high-tech manufacturers develop and manage their static budgets for maximum yield, throughput and profitability. The company develops state-of-the-art technology, providing a wide range of products and services for a variety of applications -- from cleanrooms to process equipment to electronics assembly areas. Ion has an extensive global support network, and is headquartered at 1005 Parker Street, Berkeley, Calif. 94710. Additional information, news and events about the company can be accessed on the Internet at http://www.ion.com.

Note: Certain statements contained in this document that are not historical facts, are "forward-looking statements," as that term is defined in Section 27A of the Securities Act of 1933 and Section 21E of the Securities Exchange Act of 1934, that involve a number of risks and uncertainties. Such statements involve risks and uncertainties which may cause future activities and results of operations to differ from those suggested, including risks associated with research and development programs, technology challenges in the manufacture of advanced photomasks, fluctuations in demand, installation and start-up of new equipment, accelerating technology requirements, and the need to manage growth. For additional information, please refer to DuPont Photomasks' filings with the Securities and Exchange Commission, specifically the company's most recent Forms 10-K dated September 19, 2000, the 10-Q dated January 29, 2001, and the S-3 most recently amended on September 11, 2000, which identify important risk factors that could cause actual results to differ from those contained in the forward-looking statements. Results for interim periods are not necessarily indicative of results for the year. The forward-looking statements are made as of the release date hereof and the company disclaims any intention or obligation to update or revise any forward-looking statement or to update the reasons why the actual results could differ materially from those projected in the forward-looking statements, whether as a result of new information, future events or otherwise.