AET Thermal Ships 300mm Rapid Thermal Annealer.SAN FRANCISCO--(BUSINESS WIRE)--July 16, 1966--AET Thermal Inc. today announced that they have shipped a 300mm (12 inch) Rapid Thermal Annealing RTP System to MEMC MEMC Mission Essential Minor Construction MEMC Mount Elizabeth Medical Centre (Singapore) MEMC Mitchell Electric Membership Corporation (Georgia) MEMC Monsanto Electronic Materials Company, Inc. Electronic Materials, Inc., O'Fallon, Missouri. This shipment is for the second 300mm Rapid Thermal Processing Rapid Thermal Processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. System delivered to the Semiconductor Industry by AET Thermal Inc., which is located in Milpitas, CA. Second 300mm Rapid Thermal Annealer (RTA RTA renal tubular acidosis. RTA Renal tubular acidosis, see there ) Delivered by AET Thermal, Inc. AET Thermal, Inc., who is displaying at SEMICON SEMICON Semiconductors Equipment and Material International Conference WEST (Booth 1905, Hall 2), in its announcement of the delivery of its second 300mm Rapid Thermal Annealer (nomenclature RX12), stated that it will provide delivery of the RX12 RTA within 16 weeks of receipt of order. AET Thermal has been providing Rapid Thermal Processing (RTP) Systems to the semiconductor and defense/aerospace industries, as well as to universities and national labs since 1985. AET Thermal provides RTP technology that permits the user to configure precisely the system process capabilities they need to perform virtually any application demanding a thermal process. These applications range from the most basic annealing to the most complex low pressure chemical vapor deposition Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. (LPCVD LPCVD Low Pressure Chemical Vapor Deposition ) environment. The application of AET Thermal custom RTP Systems to processing gallium arsenide and other compound semiconductors has evolved as one of the strengths of AET Thermal. More recently the requirements for AET Thermal RTP Systems for silicon processing, particularly for 200mm and 300mm wafers, have grown. Some 24 Universities use AET Thermal RTP Systems for their various research activities that cover the gamut of semiconductor and materials science related R&D. AET Thermal RTP Systems have been installed in some nine foreign countries as well as throughout the United States. The diversity of customers and applications validates the flexibility and performance features of AET Thermal RTP Systems. Also of significance is the fact that the cost of ownership is one of the lowest in the RTP and CVD CVD Cardiovascular disease, see there industries. CONTACT: AET Thermal Inc., Milpitas Edward W. Blanchard, 408/263-5464 |
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