ADVISORY/Etec Unveils New MEBES eXara Electron-Beam Maskwriting System for Nanometer-Era Chips.

Business Editors & High-Tech Writers

ADVISORY...for Thursday (Sept. 27)

NOTE TO EDITORS: Multimedia Assets Available With This Story

Include Logos, Photos, Text News Releases

--(BUSINESS WIRE)

Etec Systems Inc., an Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar Inc. company, announces the MEBES(R) eXara(tm) system, a new mask pattern generation solution for 100nm mask production and 70nm mask development. The eXara is based on the company's new MEBES X platform architecture developed in partnership with International SEMATECH SEMATECH Semiconductor Manufacturing Technology . The eXara system's high resolution 50kV electron optics electron optics
n. (used with a sing. verb)
The science of the control of electron motion by electron lenses in systems or under conditions analogous to those involving or affecting visible light.

Noun 1. and precise raster-based writing strategy provide superior linewidth control and image placement accuracy with high productivity, independent of pattern density and optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. (OPC (1) (OpenGL Performance Characterization) A project group within GPC that manages OpenGL benchmarks. OPC endorses the Viewperf and GLperf benchmarks. Viewperf was created by IBM and OPC provides viewsets for it, which are combinations of tests using specific ) complexity.

You can reach the story directly by going to http://www.newstream.com/cgi-bin/display_story.cgi?4006

This multimedia news story is for free and unrestricted use on your news information site (and for print or broadcast too). Visit http://www.newstream.com to download video, audio, text, graphics, and photos.

If you have any questions about the story, or about Newstream.com, please write to us at info@newstream.com.

COPYRIGHT 2001 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.

Reader Opinion

Article Details
Printer friendly Cite/link Email Feedback
Publication:	Business Wire
Date:	Sep 27, 2001
Words:	179
Previous Article:	AngloGold Gets Approval From South African Reserve Bank.
Next Article:	Descartes Announces Executive Change.
Topics:	Semiconductor production equipment Semiconductor production equipment industry

Related Articles
Laying-on of atoms: quantum-well wires.
Fine lines for chips: competing technologies for downsizing the transistor.
TOSHIBA DEMONSTRATES OPERATION OF SINGLE-ELECTRONTRANSISTOR CIRCUIT AT ROOM TEMPERATURE.
From silicon seeds, laser might sprout.
INTEL CREATES TECHNOLOGY TO ENABLE 'WIRELESS-INTERNET-ON-A-CHIP'.
Carbon nanotubes beam electrons. (Materials Science).
National Institute of Advanced Industrial Science and Technology (AIST) Develops Optical Control Device Structure for Quantum Computers.
National Institute of Advanced Industrial Science and Technology (AIST) Develops Desktop Apparatus Enabling Nanometer-scale Fabrication.
Fujitsu and Advantest to Establish Joint Venture to Create Semiconductor Prototypes Using Electron Beam Direct Lithography.
Fujitsu and Advantest Establish Joint Venture for LSI Prototyping Services: e-Shuttle, Inc.; World's First Commercialization of Electron Beam Direct...