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ADVISORY/Applied Materials Unveils New Photomask Etch System to Enable Nanometer Chip Generations.


Business Editors and High-Tech Writers

ADVISORY...for Thursday (Sept. 27)

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--(BUSINESS WIRE)

Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar  Inc., the leading supplier of etch To create a design in a material by digging out the material. The circuit designs on printed circuit boards and chips are etched by acid. See chip and printed circuit board.  systems to semiconductor manufacturers, along with its Mask Business Sector subsidiary, Etec Systems Inc., introduce the Tetra(TM) Photomask An opaque image on a translucent plate that is used as a light filter to transfer an image from one device to another. See chip.  Etch system, the industry's most advanced etch system for fabricating photomasks.

The Tetra system uses dry plasma technology for etching binary masks, as well as the higher-resolution phase-shift and optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e.  masks used by lithography lithography (lĭthŏg`rəfē), type of planographic or surface printing. It is distinguished from letterpress (relief) printing and from intaglio printing (in which the design is cut or etched into the plate).  systems to print nanometer-generation chip designs. Multiple systems have already been shipped to customers in Europe and the U.S., and several repeat orders have been received for the system for delivery in 2001.

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Publication:Business Wire
Geographic Code:1USA
Date:Sep 27, 2001
Words:196
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