`Chipworks Inside' the Intel Pentium 4 Processor.Business Editors & Technology Writers OTTAWA--(BUSINESS WIRE)--May 23, 2002 Chipworks, a world class leading supplier of reverse engineering services for the semiconductor, photonics and electronic systems markets, today announced that they have released their findings describing the breakthroughs in desktop processor technology discovered inside the Intel(R) Pentium(R) 4 "Northwood" processor. "The Intel(R) Pentium(R) 4, 2.4 GHz, 1.5V microprocessor is fabricated with Intel's advanced copper metal, 130 nm process," stated Dave York, Chipworks' manager, process analysis. "Published information indicates it is designed for high performance desktops and entry-level workstations and is 9 percent faster than its predecessor at 2.2GHz. The device has 8KB of Level 1 cache See L1 cache. level 1 cache - primary cache (data) and 512KB of Level 2 cache See L2 cache. level 2 cache - secondary cache (advanced transfer cache The Advanced Transfer Cache (ATC) is Intel's name for the L2 cache contained within their processors, starting with the Pentium III "Coppermine". In "Coppermine" it offered a significant boost in cache performance resulting in notable per clock performance gains for the CPU when ), with a total of 55 million transistors." According to according to prep. 1. As stated or indicated by; on the authority of: according to historians. 2. In keeping with: according to instructions. 3. Mr. York, "the device is manufactured in a full CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information , 130 nm process (60 nm gate lengths) with six levels of damascene copper (all copper) and one level of polysilicon. It uses STI STI systolic time intervals. (Shallow Trench Isolation Shallow trench isolation (STI) is an integrated circuit feature which prevents electrical current leakage between adjacent semiconductor device components. STI is generally used on CMOS process technology nodes of 250 nanometers and smaller. ) and twin wells in a P-epi on a P substrate. Cobalt silicide sil·i·cide n. A compound of silicon with another element or radical. Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical is employed on the polysilicon and diffusions (salicide process). Intel(R) indicates that the 60 nm transistors have a gate oxide thickness of approximately 15 Angstroms. "What makes this chip particularly interesting is the use of Low-K dielectric material between the copper conductors. Additionally, put under a microscope, the device presents unique and innovative circuitry providing its creators a strong competitive advantage," said Mr. York. Chipworks has documented these and related findings in a newly released structural analysis report designed to provide critical inside information of leading-edge semiconductor technology products and devices. About Chipworks Chipworks is an internationally recognized technical services company that analyzes the circuitry and physical composition of semiconductors, photonics and electronic systems for a wide range of applications in intellectual property licensing, patenting, and competitive study. Chipworks also performs technical consulting, investment analysis, and technical training seminars in these business areas. Chipworks has successfully helped leading-edge semiconductor and electronics organizations achieve their goals by supporting research and development efforts in strategic product development and patent portfolio management. Headquartered in Ottawa, Canada, the Company has offices in the United States, Japan, and Poland. Chipworks can be visited via the Internet at www.chipworks.com. |
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